Wenhao Wang and colleagues summarized the latest advancements in structural color research in Opto-Electronic Science. Their review explored the fundamental principles and fabrication methods of structural colors for ...Wenhao Wang and colleagues summarized the latest advancements in structural color research in Opto-Electronic Science. Their review explored the fundamental principles and fabrication methods of structural colors for photonic applications, including anti-counterfeiting, displays, sensors, and printing, along with their practical limitations. Recently, structural colors have received growing interest due to their advantages, including physical and chemical robustness, ecofriendliness, tunability, and high-resolution color.展开更多
1.Introduction.In recent decades,the pursuit of miniaturization has been crucial in nanofabrication,fostering innovation,and enabling novel applications in chip manufacturing,nanophotonics,and quantum devices[1,2].Adv...1.Introduction.In recent decades,the pursuit of miniaturization has been crucial in nanofabrication,fostering innovation,and enabling novel applications in chip manufacturing,nanophotonics,and quantum devices[1,2].Advancements in nanofabrication technology are driven by the demand for higher component density and performance,necessitating precise material processing in atmospheric environments.展开更多
Active sulfur dissolution and shuttle effect of lithium polysulfides(LiPSs)are the main obstacles hindering the practical application of lithium-sulfur batteries(LSBs),which is primarily induced by the direct interact...Active sulfur dissolution and shuttle effect of lithium polysulfides(LiPSs)are the main obstacles hindering the practical application of lithium-sulfur batteries(LSBs),which is primarily induced by the direct interaction between sulfur-loading cathode and liquid electrolyte.The introduction of functional interlayer within the separator and cathode is an effective strategy to stabilize the electrode/electrolyte interface reaction and improve the utilization rate of active sulfur.Herein,conductive composite nanofabrics(CCN)with multifunctional groups are employed as the interlayer of sulfur-loading cathode,in which the PMIA/PAN supporting fibers offer robust mechanical strength and high thermostable performance,and gelatin/polypyrrole functional fibers ensure high electrical conductivity and strong chemical interaction for LiPSs.As demonstrated by the experimental data and material characterizations,the presence of CCN interlayer not only blocks the shuttle behavior of LiPSs,but also strengthens the interface stability of both Li anode and sulfur-loading cathode.Interestingly,the assembled LSBs with CCN interlayer can maintain stable capacity of 686 mAh/g after 200 cycles at 0.5 A/g.This work will provide new ideas for the elaborate design of functional in terlayers/se para tors for LSBs and lithium metal batteries.展开更多
Optical monitoring of object position and alignment with nanoscale precision is critical for ultra-precision measurement applications,such as micro/nano-fabrication,weak force sensing,and micro-scopic imaging.Traditio...Optical monitoring of object position and alignment with nanoscale precision is critical for ultra-precision measurement applications,such as micro/nano-fabrication,weak force sensing,and micro-scopic imaging.Traditional optical nanometry methods often rely on precision nanostructure fabrication,multi-beam interferometry,or complex post-processing algorithms,which can limit their practical use.In this study,we introduced a simplified and robust quantum measurement technique with an achievable resolution of 2.2 pm and an experimental demonstration of 1 nm resolution,distinguishing it from conventional interferometry,which depended on multiple reference beams.We designed a metasurface substrate with a mode-conversion function,in which an incident Gaussian beam is converted into higher-order transverse electromagnetic mode(TEM)modes.A theoretical analysis,including calculations of the Fisher information,demonstrated that the accuracy was maintained for nanoscale displacements.In conclusion,the study findings provide a new approach for precise alignment and metrology of nanofabrication and other advanced applications.展开更多
Chiral metamaterials(CMs)composed by artificial chiral resonators have attracted great attentions in the recent decades due to their strong chiroptical resonance and identifiable interaction with chiral materials,faci...Chiral metamaterials(CMs)composed by artificial chiral resonators have attracted great attentions in the recent decades due to their strong chiroptical resonance and identifiable interaction with chiral materials,facilitating practical applications in chiral biosensing,chiral emission,and display technology.However,the complex geometry of CMs improves the fabrication difficulty and hinders their scalable fabrication for practical applications,especially in the visible and ultraviolet wavelengths.One potential strategy is the colloidal lithography that enables parallel fabrication for scalable and various planar structures.Here,we demonstrate a stepwise colloidal lithography technique that uses sequential deposition from multiple CMs and expand their variety and complexity.The geometry and optical chirality of building blocks from single deposition are systematically investigated,and their combination enables a significant extension of the range of chiral patterns by multiple-step depositions.This approach resulted in a myriad of complex designs with different characteristic sizes,compositions,and shapes,which are particularly beneficial for the development of nanophotonic materials.In addition,we designed a flexible chiral device based on PDMS,which exhibits a good CD value and excellent stability even after multiple inward and outward bendings.The excellent compatibility to various substrates makes the planar CMs more flexible in practical applications in microfluidic biosensing.展开更多
We describe the fabrication of metal nanogaps of sub-20nm in feature size using the proximity effect in electron beam lithography （EBL）. The proximity effect is extended to develop a flexible and practical method fo...We describe the fabrication of metal nanogaps of sub-20nm in feature size using the proximity effect in electron beam lithography （EBL）. The proximity effect is extended to develop a flexible and practical method for preparing metal （e. g. Au or Ag） nanogaps and arrays in combination with a transfer process （e. g., deposition/lift-off）. Different from the direct gap-writing process,the nanogap precursor structures （nanoconnections） were designed by GDSII software and then written by electron beam. Following a deposition and lift-off process, the metal nanogaps were obtained and the nanogap size can be lowered to -10nm by controlling the exposure dose in EBL.展开更多
Nonlinear frequency conversion is one of the most fundamental processes in nonlinear optics.It has a wide range of applications in our daily lives,including novel light sources,sensing,and information processing.It is...Nonlinear frequency conversion is one of the most fundamental processes in nonlinear optics.It has a wide range of applications in our daily lives,including novel light sources,sensing,and information processing.It is usually assumed that nonlinear frequency conversion requires large crystals that gradually accumulate a strong effect.However,the large size of nonlinear crystals is not compatible with the miniaturisation of modern photonic and optoelectronic systems.Therefore,shrinking the nonlinear structures down to the nanoscale,while keeping favourable conversion efficiencies,is of great importance for future photonics applications.In the last decade,researchers have studied the strategies for enhancing the nonlinear efficiencies at the nanoscale,e.g.by employing different nonlinear materials,resonant couplings and hybridization techniques.In this paper,we provide a compact review of the nanomaterials-based efforts,ranging from metal to dielectric and semiconductor nanostructures,including their relevant nanofabrication techniques.展开更多
Nanotechnology allows the realization of new materials and devices with basic structural unit in the range of1–100 nm and characterized by gaining control at the atomic, molecular, and supramolecular level. Reducing ...Nanotechnology allows the realization of new materials and devices with basic structural unit in the range of1–100 nm and characterized by gaining control at the atomic, molecular, and supramolecular level. Reducing the dimensions of a material into the nanoscale range usually results in the change of its physiochemical properties such as reactivity,crystallinity, and solubility. This review treats the convergence of last research news at the interface of nanostructured biomaterials and tissue engineering for emerging biomedical technologies such as scaffolding and tissue regeneration. The present review is organized into three main sections. The introduction concerns an overview of the increasing utility of nanostructured materials in the field of tissue engineering. It elucidates how nanotechnology, by working in the submicron length scale, assures the realization of a biocompatible interface that is able to reproduce the physiological cell–matrix interaction. The second, more technical section, concerns the design and fabrication of biocompatible surface characterized by micro- and submicroscale features, using microfabrication, nanolithography, and miscellaneous nanolithographic techniques.In the last part, we review the ongoing tissue engineering application of nanostructured materials and scaffolds in different fields such as neurology, cardiology, orthopedics, and skin tissue regeneration.展开更多
Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor...Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor(ITRS),NIL has emerged as the next generation lithography candidate for the22 nm and 16 nm technological nodes.In this paper,we present an overview of nanoimprint lithography.The classfication,research focus,critical issues,and the future of nanoimprint lithography are intensively elaborated.A pattern as small as 2.4 nm has been demonstrated.Full-wafer nanoimprint lithography has been completed on a 12-inch wafer.Recently,12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group,a leading nanoimprint lithography technology supplier.展开更多
As the bridge between basic principles and applications of nanotechnology,nanofabrication methods play significant role in supporting the development of nanoscale science and engineering,which is changing and improvin...As the bridge between basic principles and applications of nanotechnology,nanofabrication methods play significant role in supporting the development of nanoscale science and engineering,which is changing and improving the production and lifestyle of the human.Photo lithography and other alternative technologies,such as nanoimprinting,electron beam lithography,focused ion beam cutting,and scanning probe lithography,have brought great progress of semiconductor industry,IC manufacturing and micro/nanoelectromechanical system(MEMS/NEMS)devices.However,there remains a lot of challenges,relating to the resolution,cost,speed,and so on,in realizing high-quality products with further development of nanotechnology.None of the existing techniques can satisfy all the needs in nanoscience and nanotechnology at the same time,and it is essential to explore new nanofabrication methods.As a newly developed scanning probe microscope(SPM)-based lithography,friction-induced nanofabrication provides opportunities for maskless,flexible,low-damage,low-cost and environment-friendly processing on a wide variety of materials,including silicon,quartz,glass surfaces,and so on.It has been proved that this fabrication route provides with a broad application prospect in the fabrication of nanoimprint templates,microfluidic devices,and micro/nano optical structures.This paper hereby involved the principals and operations of friction-induced nanofabrication,including friction-induced selective etching,and the applications were reviewed as well for looking ahead at opportunities and challenges with nanotechnology development.The present review will not only enrich the knowledge in nanotribology,but also plays a positive role in promoting SPM-based nanofabrication.展开更多
Polarimetric imaging enhances the ability to distinguish objects from a bright background by detecting their particular polarization status,which offers another degree of freedom in infrared remote sensing.However,to ...Polarimetric imaging enhances the ability to distinguish objects from a bright background by detecting their particular polarization status,which offers another degree of freedom in infrared remote sensing.However,to scale up by monolithically integrating grating-based polarizers onto a focal plane array(FPA)of infrared detectors,fundamental technical obstacles must be overcome,including reductions of the extinction ratio by the misalignment between the polarizer and the detector,grating line width fluctuations,the line edge roughness,etc.This paper reports the authors’latest achievements in overcoming those problems by solving key technical issues regarding the integration of large-scale polarizers onto the chips of FPAs with individual indium gallium arsenide/indium phosphide(In Ga As/In P)sensors as the basic building blocks.Polarimetric and photovoltaic chips with divisions of the focal plane of 540×4 pixels and 320×256 superpixels have been successfully manufactured.Polarimetric imaging with enhanced contrast has been demonstrated.The progress made in this work has opened up a broad avenue toward industrialization of high quality polarimetric imaging in infrared wavelengths.展开更多
In the past decade,there has been tremendous progress in integrating chalcogenide phase-change materials(PCMs)on the silicon photonic platform for non-volatile memory to neuromorphic in-memory computing applications.I...In the past decade,there has been tremendous progress in integrating chalcogenide phase-change materials(PCMs)on the silicon photonic platform for non-volatile memory to neuromorphic in-memory computing applications.In particular,these non von Neumann computational elements and systems benefit from mass manufacturing of silicon photonic integrated circuits(PICs)on 8-inch wafers using a 130 nm complementary metal-oxide semiconductor line.Chip manufacturing based on deep-ultraviolet lithography and electron-beam lithography enables rapid prototyping of PICs,which can be integrated with high-quality PCMs based on the wafer-scale sputtering technique as a back-end-of-line process.In this article,we present an overview of recent advances in waveguide integrated PCM memory cells,functional devices,and neuromorphic systems,with an emphasis on fabrication and integration processes to attain state-of-the-art device performance.After a short overview of PCM based photonic devices,we discuss the materials properties of the functional layer as well as the progress on the light guiding layer,namely,the silicon and germanium waveguide platforms.Next,we discuss the cleanroom fabrication flow of waveguide devices integrated with thin films and nanowires,silicon waveguides and plasmonic microheaters for the electrothermal switching of PCMs and mixed-mode operation.Finally,the fabrication of photonic and photonic–electronic neuromorphic computing systems is reviewed.These systems consist of arrays of PCM memory elements for associative learning,matrix-vector multiplication,and pattern recognition.With large-scale integration,the neuromorphic photonic computing paradigm holds the promise to outperform digital electronic accelerators by taking the advantages of ultra-high bandwidth,high speed,and energy-efficient operation in running machine learning algorithms.展开更多
In this study,Ag/γ-Al_(2)O_(3)catalysts were synthesized by an Ar dielectric barrier discharge plasma using silver nitrate as the Ag source andγ-alumina(γ-Al_(2)O_(3))as the support.It is revealed that plasma can r...In this study,Ag/γ-Al_(2)O_(3)catalysts were synthesized by an Ar dielectric barrier discharge plasma using silver nitrate as the Ag source andγ-alumina(γ-Al_(2)O_(3))as the support.It is revealed that plasma can reduce silver ions to generate crystalline silver nanoparticles(Ag NPs)of good dispersion and uniformity on the alumina surface,leading to the formation of Ag/γ-Al_(2)O_(3)catalysts in a green manner without traditional chemical reductants.Ag/γ-Al_(2)O_(3)exhibited good catalytic activity and stability in CO oxidation reactions,and the activity increased with increase in the Ag content.For catalysts with more than 2 wt%Ag,100%CO conversion can be achieved at 300°C.The catalytic activity of the Ag/γ-Al_(2)O_(3)catalysts is also closely related to the size of theγ-alumina,where Ag/nano-γ-Al_(2)O_(3)catalysts demonstrate better performance than Ag/micro-γ-Al_(2)O_(3)catalysts with the same Ag content.In addition,the catalytic properties of plasma-generated Ag/nano-γ-Al_(2)O_(3)(Ag/γ-Al_(2)O_(3)-P)catalysts were compared with those of Ag/nano-γ-Al_(2)O_(3)catalysts prepared by the traditional calcination approach(Ag/γ-Al_(2)O_(3)-C),with the plasma-generated samples demonstrating better overall performance.This simple,rapid and green plasma process is considered to be applicable for the synthesis of diverse noble metal-based catalysts.展开更多
Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly ...Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly that circumvents the diffraction limit of conventional photolithography.Recently,the International Roadmap for Devices and Systems listed DSA as one of the advanced lithography techniques for the fabrication of 3-5 nm technology node devices.DSA can be combined with other lithography techniques,such as extreme ultra violet(EUV)and 193 nm immersion(193i),to further enhance the patterning resolution and the device density.So far,DSA has demonstrated its superior ability for the fabrication of nanoscale devices,such as fin field effect transistor and bit pattern media,offering a variety of configurations for high-density integration and low-cost manufacturing.Over 1 T in-2 device density can be achieved either by direct templating or coupled with nanoimprinting to improve the throughput.The development of high x block copolymer further enhances the patterning resolution of DSA.In addition to its superiority in high-resolution patterning,the implementation ofDSA on a 300 mm pivot line fully demonstrates its potential for large-scale,high-throughput,and cost-effective manufacturing in industrial environment.展开更多
Three-dimensional(3D)electrically conductive micro/nanostructures are now a key component in a broad range of research and industry fields.In this work,a novel method is developed to realize metallic 3D micro/nanostru...Three-dimensional(3D)electrically conductive micro/nanostructures are now a key component in a broad range of research and industry fields.In this work,a novel method is developed to realize metallic 3D micro/nanostructures with silver-thiol-acrylate composites via two-photon polymerization followed by femtosecond laser nanojoining.Complex 3D micro/nanoscale conductive structures have been successfully fabricated with∼200 nm resolution.The loading of silver nanowires(AgNWs)and joining of junctions successfully enhance the electrical conductivity of the composites from insulating to 92.9 Sm^−1 at room temperature.Moreover,for the first time,a reversible switching to a higher conductivity is observed,up to∼10^5Sm^−1 at 523 K.The temperature-dependent conductivity of the composite is analyzed following the variable range hopping and thermal activation models.The nanomaterial assembly and joining method demonstrated in this study pave a way towards a wide range of device applications,including 3D electronics,sensors,memristors,micro/nanoelectromechanical systems,and biomedical devices,etc.展开更多
Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fa...Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of ^52Cr through an off-resonant laser standing wave with the wavelength of 425.55 nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3 nm with height of I nm.展开更多
In this communication,we report a synthetic approach to fabricate Y-junction Co nanowires and Y-junction Cu nanowires by AC electrodeposition using a hierarchically designed anodized aluminum oxide template.Morphology...In this communication,we report a synthetic approach to fabricate Y-junction Co nanowires and Y-junction Cu nanowires by AC electrodeposition using a hierarchically designed anodized aluminum oxide template.Morphology study showe that diameters of the stems and branches of the Y-junction nanowires were about 40 nm and 20 nm respectively.Structural analysis indicates that Co nanowires had a mixture of face-center-cubic and hexagonal-close-packed structures,whereas Cu nanowires had a face-center-cubic structure with a <110> texture.The Y-junction Co nanowires exhibited a longitudinal coercivity of 1300 Oe and remnant magnetization of 56%,which was affected by the growth direction and microstructure.The present method can be extended to other metallic systems and thus provides a simple and efficient way to fabricate Y-junction metal nanowires.展开更多
Solution infiltration is a popular technique for the surface modification of solid oxide fuel cell(SOFC)cathodes.However,the synthesis of nanostructured SOFC cathodes by infiltration is a tedious process that often re...Solution infiltration is a popular technique for the surface modification of solid oxide fuel cell(SOFC)cathodes.However,the synthesis of nanostructured SOFC cathodes by infiltration is a tedious process that often requires several infiltration and high temperature(≥500℃)calcination cycles.Moreover,fabricating large-area nanostructured cathodes via infiltration still requires serious attention.Here,we propose a facile and scalable urea assisted ultrasonic spray infiltration technique for nanofabrication of SOFC cathodes.It is demonstrated that by using urea as a precipitating agent,the calcination after each infiltration cycle can be omitted and the next infiltration can be performed just after a drying step(≤100℃).Finally,the precipitates can be converted into a desired catalyst phase in single calcination thus,a nanostructured cathode can be fabricated in a much faster manner.It is also shown that the low calcination temperature of the cathode(≤900℃)can produce highly durable SOFC performance even without employing a Ce_(0.9)Gd_(0.1)O_(2)(GDC)diffusion barrier layer which provides the ease of SOFC fabrication.While coupling with an ultrasonic spray technique,the urea assisted infiltration can be scaled up for any desired cathode area.La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_(3) nanolayered cathode was fabricated and it was characterized by scanning electron microscope(SEM),X-ray diffraction(XRD),and transmission electron microscopy(TEM)techniques.SEM showed the formation of a nanolayer cathode just after 5 cycles of the urea assisted infiltration while the XRD and TEM confirmed the phase and stoichiometric uniformity of the 100 nm cathode nanolayer.The effectiveness of the newly developed technique was further verified by the stable operation of a GDC buffer layer free SOFC having an active cathode area of 25 cm^(2) during a 1200 h durability test.The research outcomes propose urea assisted ultrasonic spray infiltration as a facile,scalable,and commercially viable method for the fabrication of durable nanostructured SOFC cathodes.展开更多
Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping.Lithography in the near field using the surface plasmon polariton(...Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping.Lithography in the near field using the surface plasmon polariton(i.e.,plasmonic lithography)provides a promising solution.The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive highthroughput methods.However,a smaller and steadier plasmonic nanogap,new scheme of plasmonic lens,and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication.Herein,a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s^(-1).A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses.Parallel lithography of the nanostructures with the smallest(around 26 nm)linewidth is obtained with the prototyping system.The proposed system holds great potential for high-freedom nanofabrication with low cost,such as planar optical elements and nano-electromechanical systems.展开更多
Helium ion beam(HIB)technology plays an important role in the extreme fields of nanofabrication.This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widesprea...Helium ion beam(HIB)technology plays an important role in the extreme fields of nanofabrication.This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication.HIB-based nanofabrication includes direct-write milling,ion beam-induced deposition,and direct-write lithography without resist assistance.HIB nanoscale applications have also been evaluated in the areas of integrated circuits,materials sciences,nano-optics,and biological sciences.This review covers four thematic applications of HIB:(1)helium ion microscopy imaging for biological samples and semiconductors;(2)HIB milling and swelling for 2D/3D nanopore fabrication;(3)HIB-induced deposition for nanopillars,nanowires,and 3D nanostructures;(4)additional HIB direct writing for resist,graphene,and plasmonic nanostructures.This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.展开更多
基金supported by the POSCO-POSTECH-RIST Convergence Research Center program funded by POSCOthe National Research Foundation(NRF)grants(RS-2022-NR067559,RS-2023-00302586)funded by the Ministry of Science and ICT(MSIT)of the Korean government.
文摘Wenhao Wang and colleagues summarized the latest advancements in structural color research in Opto-Electronic Science. Their review explored the fundamental principles and fabrication methods of structural colors for photonic applications, including anti-counterfeiting, displays, sensors, and printing, along with their practical limitations. Recently, structural colors have received growing interest due to their advantages, including physical and chemical robustness, ecofriendliness, tunability, and high-resolution color.
基金supported by the National Natural Science Foun-dation of China(51975017 and 52405448)the Human Resource Training Project(HRTP-[2022]-53)of Innovation Laboratory for Sciences and Technologies of Energy Materials of Fujian Province(IKKEM)the support by the China Postdoctoral Science Foundation(2024M750149 and GZC20240087).
文摘1.Introduction.In recent decades,the pursuit of miniaturization has been crucial in nanofabrication,fostering innovation,and enabling novel applications in chip manufacturing,nanophotonics,and quantum devices[1,2].Advancements in nanofabrication technology are driven by the demand for higher component density and performance,necessitating precise material processing in atmospheric environments.
基金supported by National Natural Science Foundation of China(No.22309029)Guangdong Basic and Applied Basic Research Foundation(No.2021A1515110089)+2 种基金Dongguan Social Development Technology Foundation(No.20231800907933)Collaborative Innovation Center of Marine Science and Technology of Hainan University(No.XTCX2022HYC14)Start-up Research Foundation of Hainan University(No.KYQD(ZR)-23069)。
文摘Active sulfur dissolution and shuttle effect of lithium polysulfides(LiPSs)are the main obstacles hindering the practical application of lithium-sulfur batteries(LSBs),which is primarily induced by the direct interaction between sulfur-loading cathode and liquid electrolyte.The introduction of functional interlayer within the separator and cathode is an effective strategy to stabilize the electrode/electrolyte interface reaction and improve the utilization rate of active sulfur.Herein,conductive composite nanofabrics(CCN)with multifunctional groups are employed as the interlayer of sulfur-loading cathode,in which the PMIA/PAN supporting fibers offer robust mechanical strength and high thermostable performance,and gelatin/polypyrrole functional fibers ensure high electrical conductivity and strong chemical interaction for LiPSs.As demonstrated by the experimental data and material characterizations,the presence of CCN interlayer not only blocks the shuttle behavior of LiPSs,but also strengthens the interface stability of both Li anode and sulfur-loading cathode.Interestingly,the assembled LSBs with CCN interlayer can maintain stable capacity of 686 mAh/g after 200 cycles at 0.5 A/g.This work will provide new ideas for the elaborate design of functional in terlayers/se para tors for LSBs and lithium metal batteries.
基金supported by the West Light Project,CAS(xbzg-zdsys-202206)the National Key Research and Development Program of China(2021YFA1401003)+1 种基金the National Natural Science Foundation of China(NSFC)(62222513,U24A6010,and U24A20317)the Sichuan Engineering Research Center of Digital Materials.
文摘Optical monitoring of object position and alignment with nanoscale precision is critical for ultra-precision measurement applications,such as micro/nano-fabrication,weak force sensing,and micro-scopic imaging.Traditional optical nanometry methods often rely on precision nanostructure fabrication,multi-beam interferometry,or complex post-processing algorithms,which can limit their practical use.In this study,we introduced a simplified and robust quantum measurement technique with an achievable resolution of 2.2 pm and an experimental demonstration of 1 nm resolution,distinguishing it from conventional interferometry,which depended on multiple reference beams.We designed a metasurface substrate with a mode-conversion function,in which an incident Gaussian beam is converted into higher-order transverse electromagnetic mode(TEM)modes.A theoretical analysis,including calculations of the Fisher information,demonstrated that the accuracy was maintained for nanoscale displacements.In conclusion,the study findings provide a new approach for precise alignment and metrology of nanofabrication and other advanced applications.
基金This study was financially supported by the International Science and Technology Innovation Cooperation of Sichuan Province(No.21GJHZ0230)the National Natural Science Foundation of China(No.11604227)+1 种基金the International Visiting Program for Excellent Young Scholars of SCU(No.20181504)the Tenure Track program of the University of Twente.
文摘Chiral metamaterials(CMs)composed by artificial chiral resonators have attracted great attentions in the recent decades due to their strong chiroptical resonance and identifiable interaction with chiral materials,facilitating practical applications in chiral biosensing,chiral emission,and display technology.However,the complex geometry of CMs improves the fabrication difficulty and hinders their scalable fabrication for practical applications,especially in the visible and ultraviolet wavelengths.One potential strategy is the colloidal lithography that enables parallel fabrication for scalable and various planar structures.Here,we demonstrate a stepwise colloidal lithography technique that uses sequential deposition from multiple CMs and expand their variety and complexity.The geometry and optical chirality of building blocks from single deposition are systematically investigated,and their combination enables a significant extension of the range of chiral patterns by multiple-step depositions.This approach resulted in a myriad of complex designs with different characteristic sizes,compositions,and shapes,which are particularly beneficial for the development of nanophotonic materials.In addition,we designed a flexible chiral device based on PDMS,which exhibits a good CD value and excellent stability even after multiple inward and outward bendings.The excellent compatibility to various substrates makes the planar CMs more flexible in practical applications in microfluidic biosensing.
基金the National Natural Science Foundation of China(No.20704042)the Shanghai Pujiang Talent Plan(No.07PJ14095)+1 种基金the CAS Knowledge Innovation Programthe Committee of Science and Technology of Shanghai(Nos.06XD14020,07JC14058,0752nm016)~~
文摘We describe the fabrication of metal nanogaps of sub-20nm in feature size using the proximity effect in electron beam lithography （EBL）. The proximity effect is extended to develop a flexible and practical method for preparing metal （e. g. Au or Ag） nanogaps and arrays in combination with a transfer process （e. g., deposition/lift-off）. Different from the direct gap-writing process,the nanogap precursor structures （nanoconnections） were designed by GDSII software and then written by electron beam. Following a deposition and lift-off process, the metal nanogaps were obtained and the nanogap size can be lowered to -10nm by controlling the exposure dose in EBL.
文摘Nonlinear frequency conversion is one of the most fundamental processes in nonlinear optics.It has a wide range of applications in our daily lives,including novel light sources,sensing,and information processing.It is usually assumed that nonlinear frequency conversion requires large crystals that gradually accumulate a strong effect.However,the large size of nonlinear crystals is not compatible with the miniaturisation of modern photonic and optoelectronic systems.Therefore,shrinking the nonlinear structures down to the nanoscale,while keeping favourable conversion efficiencies,is of great importance for future photonics applications.In the last decade,researchers have studied the strategies for enhancing the nonlinear efficiencies at the nanoscale,e.g.by employing different nonlinear materials,resonant couplings and hybridization techniques.In this paper,we provide a compact review of the nanomaterials-based efforts,ranging from metal to dielectric and semiconductor nanostructures,including their relevant nanofabrication techniques.
文摘Nanotechnology allows the realization of new materials and devices with basic structural unit in the range of1–100 nm and characterized by gaining control at the atomic, molecular, and supramolecular level. Reducing the dimensions of a material into the nanoscale range usually results in the change of its physiochemical properties such as reactivity,crystallinity, and solubility. This review treats the convergence of last research news at the interface of nanostructured biomaterials and tissue engineering for emerging biomedical technologies such as scaffolding and tissue regeneration. The present review is organized into three main sections. The introduction concerns an overview of the increasing utility of nanostructured materials in the field of tissue engineering. It elucidates how nanotechnology, by working in the submicron length scale, assures the realization of a biocompatible interface that is able to reproduce the physiological cell–matrix interaction. The second, more technical section, concerns the design and fabrication of biocompatible surface characterized by micro- and submicroscale features, using microfabrication, nanolithography, and miscellaneous nanolithographic techniques.In the last part, we review the ongoing tissue engineering application of nanostructured materials and scaffolds in different fields such as neurology, cardiology, orthopedics, and skin tissue regeneration.
基金supported by Natural Science Foundation of Shanghai(No.11ZR1432100)Shanghai Postdoctoral Science Foundation(11R21420900)
文摘Nanoimprint lithography(NIL) is an emerging micro/nano-patterning technique,which is a high-resolution,high-throughput and yet simple fabrication process.According to International Technology Roadmap for Semiconductor(ITRS),NIL has emerged as the next generation lithography candidate for the22 nm and 16 nm technological nodes.In this paper,we present an overview of nanoimprint lithography.The classfication,research focus,critical issues,and the future of nanoimprint lithography are intensively elaborated.A pattern as small as 2.4 nm has been demonstrated.Full-wafer nanoimprint lithography has been completed on a 12-inch wafer.Recently,12.5 nm pattern resolution through soft molecular scale nanoimprint lithography has been achieved by EV Group,a leading nanoimprint lithography technology supplier.
基金Supported by National Natural Science Foundation of China(Grant Nos.51775462,51991373).
文摘As the bridge between basic principles and applications of nanotechnology,nanofabrication methods play significant role in supporting the development of nanoscale science and engineering,which is changing and improving the production and lifestyle of the human.Photo lithography and other alternative technologies,such as nanoimprinting,electron beam lithography,focused ion beam cutting,and scanning probe lithography,have brought great progress of semiconductor industry,IC manufacturing and micro/nanoelectromechanical system(MEMS/NEMS)devices.However,there remains a lot of challenges,relating to the resolution,cost,speed,and so on,in realizing high-quality products with further development of nanotechnology.None of the existing techniques can satisfy all the needs in nanoscience and nanotechnology at the same time,and it is essential to explore new nanofabrication methods.As a newly developed scanning probe microscope(SPM)-based lithography,friction-induced nanofabrication provides opportunities for maskless,flexible,low-damage,low-cost and environment-friendly processing on a wide variety of materials,including silicon,quartz,glass surfaces,and so on.It has been proved that this fabrication route provides with a broad application prospect in the fabrication of nanoimprint templates,microfluidic devices,and micro/nano optical structures.This paper hereby involved the principals and operations of friction-induced nanofabrication,including friction-induced selective etching,and the applications were reviewed as well for looking ahead at opportunities and challenges with nanotechnology development.The present review will not only enrich the knowledge in nanotribology,but also plays a positive role in promoting SPM-based nanofabrication.
基金financially supported by the following projects:Open project of SITP(Project Number:IIMDKFJJ-18-09)National Natural Science Foundation of China(Project Number:61927820)+2 种基金The STCSM2019-11-20 funding(Project Number:19142202700)National Natural Science Foundation of China(Project Number:NSF No.U1732104)Zhejiang Lab’s International Talent Fund for Young Professionals。
文摘Polarimetric imaging enhances the ability to distinguish objects from a bright background by detecting their particular polarization status,which offers another degree of freedom in infrared remote sensing.However,to scale up by monolithically integrating grating-based polarizers onto a focal plane array(FPA)of infrared detectors,fundamental technical obstacles must be overcome,including reductions of the extinction ratio by the misalignment between the polarizer and the detector,grating line width fluctuations,the line edge roughness,etc.This paper reports the authors’latest achievements in overcoming those problems by solving key technical issues regarding the integration of large-scale polarizers onto the chips of FPAs with individual indium gallium arsenide/indium phosphide(In Ga As/In P)sensors as the basic building blocks.Polarimetric and photovoltaic chips with divisions of the focal plane of 540×4 pixels and 320×256 superpixels have been successfully manufactured.Polarimetric imaging with enhanced contrast has been demonstrated.The progress made in this work has opened up a broad avenue toward industrialization of high quality polarimetric imaging in infrared wavelengths.
基金the support of the National Natural Science Foundation of China(Grant No.62204201)。
文摘In the past decade,there has been tremendous progress in integrating chalcogenide phase-change materials(PCMs)on the silicon photonic platform for non-volatile memory to neuromorphic in-memory computing applications.In particular,these non von Neumann computational elements and systems benefit from mass manufacturing of silicon photonic integrated circuits(PICs)on 8-inch wafers using a 130 nm complementary metal-oxide semiconductor line.Chip manufacturing based on deep-ultraviolet lithography and electron-beam lithography enables rapid prototyping of PICs,which can be integrated with high-quality PCMs based on the wafer-scale sputtering technique as a back-end-of-line process.In this article,we present an overview of recent advances in waveguide integrated PCM memory cells,functional devices,and neuromorphic systems,with an emphasis on fabrication and integration processes to attain state-of-the-art device performance.After a short overview of PCM based photonic devices,we discuss the materials properties of the functional layer as well as the progress on the light guiding layer,namely,the silicon and germanium waveguide platforms.Next,we discuss the cleanroom fabrication flow of waveguide devices integrated with thin films and nanowires,silicon waveguides and plasmonic microheaters for the electrothermal switching of PCMs and mixed-mode operation.Finally,the fabrication of photonic and photonic–electronic neuromorphic computing systems is reviewed.These systems consist of arrays of PCM memory elements for associative learning,matrix-vector multiplication,and pattern recognition.With large-scale integration,the neuromorphic photonic computing paradigm holds the promise to outperform digital electronic accelerators by taking the advantages of ultra-high bandwidth,high speed,and energy-efficient operation in running machine learning algorithms.
基金financial support from National Natural Science Foundation of China(Nos.52004102 and 22078125)Postdoctoral Science Foundation of China(No.2021M690068)+2 种基金Fundamental Research Funds for the Central Universities(Nos.JUSRP221018 and JUSRP622038)Key Laboratory of Green Cleaning Technology and Detergent of Zhejiang Province(No.Q202204)Open Project of Key Laboratory of Green Chemical Engineering Process of Ministry of Education(No.GCP202112)。
文摘In this study,Ag/γ-Al_(2)O_(3)catalysts were synthesized by an Ar dielectric barrier discharge plasma using silver nitrate as the Ag source andγ-alumina(γ-Al_(2)O_(3))as the support.It is revealed that plasma can reduce silver ions to generate crystalline silver nanoparticles(Ag NPs)of good dispersion and uniformity on the alumina surface,leading to the formation of Ag/γ-Al_(2)O_(3)catalysts in a green manner without traditional chemical reductants.Ag/γ-Al_(2)O_(3)exhibited good catalytic activity and stability in CO oxidation reactions,and the activity increased with increase in the Ag content.For catalysts with more than 2 wt%Ag,100%CO conversion can be achieved at 300°C.The catalytic activity of the Ag/γ-Al_(2)O_(3)catalysts is also closely related to the size of theγ-alumina,where Ag/nano-γ-Al_(2)O_(3)catalysts demonstrate better performance than Ag/micro-γ-Al_(2)O_(3)catalysts with the same Ag content.In addition,the catalytic properties of plasma-generated Ag/nano-γ-Al_(2)O_(3)(Ag/γ-Al_(2)O_(3)-P)catalysts were compared with those of Ag/nano-γ-Al_(2)O_(3)catalysts prepared by the traditional calcination approach(Ag/γ-Al_(2)O_(3)-C),with the plasma-generated samples demonstrating better overall performance.This simple,rapid and green plasma process is considered to be applicable for the synthesis of diverse noble metal-based catalysts.
文摘Directed self-assembly(DSA)emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography.DSA achieves high-resolution patterning by molecular assembly that circumvents the diffraction limit of conventional photolithography.Recently,the International Roadmap for Devices and Systems listed DSA as one of the advanced lithography techniques for the fabrication of 3-5 nm technology node devices.DSA can be combined with other lithography techniques,such as extreme ultra violet(EUV)and 193 nm immersion(193i),to further enhance the patterning resolution and the device density.So far,DSA has demonstrated its superior ability for the fabrication of nanoscale devices,such as fin field effect transistor and bit pattern media,offering a variety of configurations for high-density integration and low-cost manufacturing.Over 1 T in-2 device density can be achieved either by direct templating or coupled with nanoimprinting to improve the throughput.The development of high x block copolymer further enhances the patterning resolution of DSA.In addition to its superiority in high-resolution patterning,the implementation ofDSA on a 300 mm pivot line fully demonstrates its potential for large-scale,high-throughput,and cost-effective manufacturing in industrial environment.
基金This research was financially supported by the National Key R&D Program of China(2017YFB1104300)the National Science Foundation(CMMI 1825608)Nebraska Center for Energy Sciences Research,and National Natural Science Foundation of China(61774067).The authors would like to thank Professor Stephen Ducharme for valuable discussions regarding the electrical conductivity analysis of this work and Joel Brehm for figure improvement.
文摘Three-dimensional(3D)electrically conductive micro/nanostructures are now a key component in a broad range of research and industry fields.In this work,a novel method is developed to realize metallic 3D micro/nanostructures with silver-thiol-acrylate composites via two-photon polymerization followed by femtosecond laser nanojoining.Complex 3D micro/nanoscale conductive structures have been successfully fabricated with∼200 nm resolution.The loading of silver nanowires(AgNWs)and joining of junctions successfully enhance the electrical conductivity of the composites from insulating to 92.9 Sm^−1 at room temperature.Moreover,for the first time,a reversible switching to a higher conductivity is observed,up to∼10^5Sm^−1 at 523 K.The temperature-dependent conductivity of the composite is analyzed following the variable range hopping and thermal activation models.The nanomaterial assembly and joining method demonstrated in this study pave a way towards a wide range of device applications,including 3D electronics,sensors,memristors,micro/nanoelectromechanical systems,and biomedical devices,etc.
文摘Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of ^52Cr through an off-resonant laser standing wave with the wavelength of 425.55 nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3 nm with height of I nm.
基金financially supported partially by a NSF award CMMI-0825990
文摘In this communication,we report a synthetic approach to fabricate Y-junction Co nanowires and Y-junction Cu nanowires by AC electrodeposition using a hierarchically designed anodized aluminum oxide template.Morphology study showe that diameters of the stems and branches of the Y-junction nanowires were about 40 nm and 20 nm respectively.Structural analysis indicates that Co nanowires had a mixture of face-center-cubic and hexagonal-close-packed structures,whereas Cu nanowires had a face-center-cubic structure with a <110> texture.The Y-junction Co nanowires exhibited a longitudinal coercivity of 1300 Oe and remnant magnetization of 56%,which was affected by the growth direction and microstructure.The present method can be extended to other metallic systems and thus provides a simple and efficient way to fabricate Y-junction metal nanowires.
基金supported by the Korea Institute of Energy Technology Evaluation and Planning(KETEP)and the Ministry of Trade,Industry&Energy(MOTIE)of the Republic of Korea(20203030030020,20203030030080,20213030030150)。
文摘Solution infiltration is a popular technique for the surface modification of solid oxide fuel cell(SOFC)cathodes.However,the synthesis of nanostructured SOFC cathodes by infiltration is a tedious process that often requires several infiltration and high temperature(≥500℃)calcination cycles.Moreover,fabricating large-area nanostructured cathodes via infiltration still requires serious attention.Here,we propose a facile and scalable urea assisted ultrasonic spray infiltration technique for nanofabrication of SOFC cathodes.It is demonstrated that by using urea as a precipitating agent,the calcination after each infiltration cycle can be omitted and the next infiltration can be performed just after a drying step(≤100℃).Finally,the precipitates can be converted into a desired catalyst phase in single calcination thus,a nanostructured cathode can be fabricated in a much faster manner.It is also shown that the low calcination temperature of the cathode(≤900℃)can produce highly durable SOFC performance even without employing a Ce_(0.9)Gd_(0.1)O_(2)(GDC)diffusion barrier layer which provides the ease of SOFC fabrication.While coupling with an ultrasonic spray technique,the urea assisted infiltration can be scaled up for any desired cathode area.La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_(3) nanolayered cathode was fabricated and it was characterized by scanning electron microscope(SEM),X-ray diffraction(XRD),and transmission electron microscopy(TEM)techniques.SEM showed the formation of a nanolayer cathode just after 5 cycles of the urea assisted infiltration while the XRD and TEM confirmed the phase and stoichiometric uniformity of the 100 nm cathode nanolayer.The effectiveness of the newly developed technique was further verified by the stable operation of a GDC buffer layer free SOFC having an active cathode area of 25 cm^(2) during a 1200 h durability test.The research outcomes propose urea assisted ultrasonic spray infiltration as a facile,scalable,and commercially viable method for the fabrication of durable nanostructured SOFC cathodes.
基金We acknowledge the financial support by the National Natural Science Foundation of China(91623105 and 52005175)Natural Science Foundation of Hunan Province of China(2020JJ5059).
文摘Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping.Lithography in the near field using the surface plasmon polariton(i.e.,plasmonic lithography)provides a promising solution.The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive highthroughput methods.However,a smaller and steadier plasmonic nanogap,new scheme of plasmonic lens,and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication.Herein,a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s^(-1).A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses.Parallel lithography of the nanostructures with the smallest(around 26 nm)linewidth is obtained with the prototyping system.The proposed system holds great potential for high-freedom nanofabrication with low cost,such as planar optical elements and nano-electromechanical systems.
基金supported by research funding from Natural Science Foundation of Chongqing,China(Grant No.cstc2018jcyjAX0310,cstc2017jcyjB0105,cstc2018jcyjAX0304)National Natural Science Foundation of China(Grant Nos.61701474,31800711)+1 种基金Instrument development program of CAS(YZ201568)Pioneer Hundred Talents Program of CAS(Liang Wang)and Youth Innovation Promotion Association of the Chinese Academy of Sciences(2017392).
文摘Helium ion beam(HIB)technology plays an important role in the extreme fields of nanofabrication.This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication.HIB-based nanofabrication includes direct-write milling,ion beam-induced deposition,and direct-write lithography without resist assistance.HIB nanoscale applications have also been evaluated in the areas of integrated circuits,materials sciences,nano-optics,and biological sciences.This review covers four thematic applications of HIB:(1)helium ion microscopy imaging for biological samples and semiconductors;(2)HIB milling and swelling for 2D/3D nanopore fabrication;(3)HIB-induced deposition for nanopillars,nanowires,and 3D nanostructures;(4)additional HIB direct writing for resist,graphene,and plasmonic nanostructures.This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.
