用 MOCVD方法生长了 In Ga As/ In Ga As P多量子阱微碟激光器外延片 ,用光刻、干法刻蚀和湿法刻蚀等现代化的微加工技术制备出直径 9.5μm的 In Ga As/ In Ga As P微碟激光器 ,并详细介绍了整个制备工艺过程 .在液氮温度下用氩离子激...用 MOCVD方法生长了 In Ga As/ In Ga As P多量子阱微碟激光器外延片 ,用光刻、干法刻蚀和湿法刻蚀等现代化的微加工技术制备出直径 9.5μm的 In Ga As/ In Ga As P微碟激光器 ,并详细介绍了整个制备工艺过程 .在液氮温度下用氩离子激光器泵浦方式实现了低阈值光泵激射 ,测出单个微碟激光器的阈值光功率为 15 0μW,激射波长约为 1.6μm,品质因数 Q=80 0 ,激射光谱线宽为 2 nm,同时指出微碟激光器激射线宽比 F-展开更多
GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed r...GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed regime at room temperature. At 20℃, the threshold current density is 3 8kA/cm 2 and the external different quantum efficiency is 9 3%.展开更多
对晶格与 In P匹配的 In Ga As P超晶格结构外延片 ,运用等离子增强化学气相沉积法镀Si O2 膜 ,随后用碘钨灯快速热退火 ,进行无杂质空位扩散 ( IFVD)技术的实验研究 ,测量光致发光谱后得到了最大 50 nm的峰值位置蓝移 ;表明在没有掺杂...对晶格与 In P匹配的 In Ga As P超晶格结构外延片 ,运用等离子增强化学气相沉积法镀Si O2 膜 ,随后用碘钨灯快速热退火 ,进行无杂质空位扩散 ( IFVD)技术的实验研究 ,测量光致发光谱后得到了最大 50 nm的峰值位置蓝移 ;表明在没有掺杂和没有应变的情况下 ,IFVD仍有较好的处理量子阱材料的能力 .对影响 IFVD工艺的重复性因素进行了探讨 .展开更多
High-strained InGaAs/InGaAsP multiple quantum wells （MQWs） distributed feedback （DFB） lasers, fab- ricated using metal organic chemical vapor deposition, are presented at 1,82 μm with a high side-mode- suppressio...High-strained InGaAs/InGaAsP multiple quantum wells （MQWs） distributed feedback （DFB） lasers, fab- ricated using metal organic chemical vapor deposition, are presented at 1,82 μm with a high side-mode- suppression ratio of 49.53 dB. The current- and temperature-tuning rates of the DFB mode wavelength are 0.01 nm/mA and 0.13 nm/℃, respectively. A characteristic temperature of 51 K is also confirmed. The DFB laser demonstrates good performance and can be apt）lied to H2O concentration sensing.展开更多
采用 L P- MOVPE在 Si O2 掩膜的 In P衬底上实现了高质量的 In Ga As P多量子阱 (MQW)的选择区域生长(SAG) .通过改变生长温度和生长压力 ,MQW的适用范围由 C波段扩展至 L 波段 ,即 MQW的光致发光波长从15 46 nm延展至 16 2 1nm.光致发...采用 L P- MOVPE在 Si O2 掩膜的 In P衬底上实现了高质量的 In Ga As P多量子阱 (MQW)的选择区域生长(SAG) .通过改变生长温度和生长压力 ,MQW的适用范围由 C波段扩展至 L 波段 ,即 MQW的光致发光波长从15 46 nm延展至 16 2 1nm.光致发光 (PL)测试表明 :在宽达 75 nm的波长范围内 ,MQW的质量与非选择生长的MQW质量相当 ,并成功制作出电吸收调制 DFB激光器 (EML) .展开更多
文摘用 MOCVD方法生长了 In Ga As/ In Ga As P多量子阱微碟激光器外延片 ,用光刻、干法刻蚀和湿法刻蚀等现代化的微加工技术制备出直径 9.5μm的 In Ga As/ In Ga As P微碟激光器 ,并详细介绍了整个制备工艺过程 .在液氮温度下用氩离子激光器泵浦方式实现了低阈值光泵激射 ,测出单个微碟激光器的阈值光功率为 15 0μW,激射波长约为 1.6μm,品质因数 Q=80 0 ,激射光谱线宽为 2 nm,同时指出微碟激光器激射线宽比 F-
文摘GSMBE grown 1 84 micron wavelength InGaAs/InGaAsP/InP strained quantum well lasers are reported. Lasers with 800 micron long cavity and 40 micron wide planar electrical stripe have been operated under the pulsed regime at room temperature. At 20℃, the threshold current density is 3 8kA/cm 2 and the external different quantum efficiency is 9 3%.
基金supported by the National "863" Project of China(No.2012AA012203)the National "973" Program of China(No.2011CB301702)
文摘High-strained InGaAs/InGaAsP multiple quantum wells （MQWs） distributed feedback （DFB） lasers, fab- ricated using metal organic chemical vapor deposition, are presented at 1,82 μm with a high side-mode- suppression ratio of 49.53 dB. The current- and temperature-tuning rates of the DFB mode wavelength are 0.01 nm/mA and 0.13 nm/℃, respectively. A characteristic temperature of 51 K is also confirmed. The DFB laser demonstrates good performance and can be apt）lied to H2O concentration sensing.
文摘采用 L P- MOVPE在 Si O2 掩膜的 In P衬底上实现了高质量的 In Ga As P多量子阱 (MQW)的选择区域生长(SAG) .通过改变生长温度和生长压力 ,MQW的适用范围由 C波段扩展至 L 波段 ,即 MQW的光致发光波长从15 46 nm延展至 16 2 1nm.光致发光 (PL)测试表明 :在宽达 75 nm的波长范围内 ,MQW的质量与非选择生长的MQW质量相当 ,并成功制作出电吸收调制 DFB激光器 (EML) .
