利用分子束外延 (MBE)技术在高指数面 Ga As衬底上自组织生长了应变 In Ga As/Ga As量子线材料。原子力显微镜 (AFM)观测结果表明量子线的密度高达 4× 1 0 5/cm。低温偏振光致发光谱 (PPL)研究发现其发光峰半高宽 (FWHM)最小为 9.2...利用分子束外延 (MBE)技术在高指数面 Ga As衬底上自组织生长了应变 In Ga As/Ga As量子线材料。原子力显微镜 (AFM)观测结果表明量子线的密度高达 4× 1 0 5/cm。低温偏振光致发光谱 (PPL)研究发现其发光峰半高宽 (FWHM)最小为 9.2 me V,最大偏振度可达 0 .2 2。以 Al Ga As为垫垒 ,In Ga As/Ga As量子线为沟道 ,成功制备了量子线场效应管 (QWR-FET)结构材料 ,并试制了器件 。展开更多
The In segregation and its suppression in InGaAs/AlGaAs quantum well are investigated by using high-resolution x-ray diffraction(XRD)and photoluminescence(PL),combined with the state-of-the-art aberration corrected sc...The In segregation and its suppression in InGaAs/AlGaAs quantum well are investigated by using high-resolution x-ray diffraction(XRD)and photoluminescence(PL),combined with the state-of-the-art aberration corrected scanning transmission electron microscopy(Cs-STEM)techniques.To facility our study,we grow two multiple quantum wells(MQWs)samples,which are almost identical except that in sample B a thin GaAs layer is inserted in each of the InGaAs well and AlGaAs barrier layer comparing to pristine InGaAs/AlGaAs MQWs(sample A).Our study indeed shows the direct evidences that In segregation occurs in the InGaAs/AlGaAs interface,and the effect of the Ga As insertion layer on suppressing the segregation of In atoms is also demonstrated on the atomic-scale.Therefore,the atomic-scale insights are provided to understand the segregation behavior of In atoms and to unravel the underlying mechanism of the effect of GaAs insertion layer on the improvement of crystallinity,interface roughness,and further an enhanced optical performance of InGaAs/AlGaAs QWs.展开更多
This work deals with the study of optical and morphological properties of InGaAs/AlGaAs quantum dot(QD) structures grown by molecular beam epitaxy(MBE) . Photoluminescence(PL) emission energies,activation energies of ...This work deals with the study of optical and morphological properties of InGaAs/AlGaAs quantum dot(QD) structures grown by molecular beam epitaxy(MBE) . Photoluminescence(PL) emission energies,activation energies of PL quenching and QD sizes are studied as functions of the Al content in the AlyGa1-yAs confining layers(CL) . We show that the PL emission energy of In(Ga) As/AlyGa1-yAs QD structures increases with increasing y and that the sizes of InAs/AlyGa1-yAs QDs decrease with increasing y. By the comparison of the experimental results with those of an effective-mass model developed to calculate the QD fundamental transition energies,we show that the blueshift of emission energy has to be ascribed not only to the increase in barrier discontinuities that confine the carriers into QDs but even to effects related to changes of the QD morphology dependent on CL composition. Moreover,we show that the Al content in the barriers determines also the activation energy of thermal quenching of PL,which depends on the thermal escape of carriers from QD levels. These studies resulted in the preparation of structures with efficient light-emission in the 980 nm spectral window of interest for lightwave communications.展开更多
文摘利用分子束外延 (MBE)技术在高指数面 Ga As衬底上自组织生长了应变 In Ga As/Ga As量子线材料。原子力显微镜 (AFM)观测结果表明量子线的密度高达 4× 1 0 5/cm。低温偏振光致发光谱 (PPL)研究发现其发光峰半高宽 (FWHM)最小为 9.2 me V,最大偏振度可达 0 .2 2。以 Al Ga As为垫垒 ,In Ga As/Ga As量子线为沟道 ,成功制备了量子线场效应管 (QWR-FET)结构材料 ,并试制了器件 。
基金X.H.gratefully acknowledges the financial support from the National Natural Science Foundation of China(Grant No.21902096)the Scientific Research Foundation of Shaanxi University of Science and Technology(Grant No.126061803)+1 种基金S.M.and B.X.thank the National Natural Science Foundation of China(Grant No.21972103)the Shanxi Provincial Key Innovative Research Team in Science and Technology(Grant No.201703D111026).
文摘The In segregation and its suppression in InGaAs/AlGaAs quantum well are investigated by using high-resolution x-ray diffraction(XRD)and photoluminescence(PL),combined with the state-of-the-art aberration corrected scanning transmission electron microscopy(Cs-STEM)techniques.To facility our study,we grow two multiple quantum wells(MQWs)samples,which are almost identical except that in sample B a thin GaAs layer is inserted in each of the InGaAs well and AlGaAs barrier layer comparing to pristine InGaAs/AlGaAs MQWs(sample A).Our study indeed shows the direct evidences that In segregation occurs in the InGaAs/AlGaAs interface,and the effect of the Ga As insertion layer on suppressing the segregation of In atoms is also demonstrated on the atomic-scale.Therefore,the atomic-scale insights are provided to understand the segregation behavior of In atoms and to unravel the underlying mechanism of the effect of GaAs insertion layer on the improvement of crystallinity,interface roughness,and further an enhanced optical performance of InGaAs/AlGaAs QWs.
基金The work has been partially supported by the "SANDiE" Networkof Excellence of EU (contract No. NMP4-CT-2004-500101).
文摘This work deals with the study of optical and morphological properties of InGaAs/AlGaAs quantum dot(QD) structures grown by molecular beam epitaxy(MBE) . Photoluminescence(PL) emission energies,activation energies of PL quenching and QD sizes are studied as functions of the Al content in the AlyGa1-yAs confining layers(CL) . We show that the PL emission energy of In(Ga) As/AlyGa1-yAs QD structures increases with increasing y and that the sizes of InAs/AlyGa1-yAs QDs decrease with increasing y. By the comparison of the experimental results with those of an effective-mass model developed to calculate the QD fundamental transition energies,we show that the blueshift of emission energy has to be ascribed not only to the increase in barrier discontinuities that confine the carriers into QDs but even to effects related to changes of the QD morphology dependent on CL composition. Moreover,we show that the Al content in the barriers determines also the activation energy of thermal quenching of PL,which depends on the thermal escape of carriers from QD levels. These studies resulted in the preparation of structures with efficient light-emission in the 980 nm spectral window of interest for lightwave communications.
