Nearly lattice-matched InAIGaN/GaN heterostructure is grown on sapphire substrates by pulsed metal organic chemical vapor deposition and excellent high electron mobility transistors are fabricated on this heterostruct...Nearly lattice-matched InAIGaN/GaN heterostructure is grown on sapphire substrates by pulsed metal organic chemical vapor deposition and excellent high electron mobility transistors are fabricated on this heterostructure. The electron mobility is 1668.08cm2/V.s together with a high two-dimensional-electron-gas density of 1.43 × 10^13 cm-2 for the InAlCaN/CaN heterostructure of 2Onto InAlCaN quaternary barrier. High electron mobility transistors with gate dimensions of 1 × 50 μm2 and 4μm source-drain distance exhibit the maximum drain current of 763.91 mA/mm, the maximum extrinsic transconductance of 163.13 mS/mm, and current gain and maximum oscillation cutoff frequencies of 11 GHz and 21 GHz, respectively.展开更多
Pulsed metal organic chemical vapor deposition was employed to grow nearly polarization matched InAlGaN/GaN heterostructures.A relatively low sheet carrier density of 1.8×10^(12)cm^(-2),together with a high elect...Pulsed metal organic chemical vapor deposition was employed to grow nearly polarization matched InAlGaN/GaN heterostructures.A relatively low sheet carrier density of 1.8×10^(12)cm^(-2),together with a high electron mobility of 1229.5 cm^2/V·s,was obtained for the prepared heterostructures.The surface morphology of the heterostructures was also significantly improved,i.e.,with a root mean square roughness of 0.29 nm in a 2μm×2μm scan area.In addition to the improved properties,the enhancement-mode metal–oxide–semiconductor high electron mobility transistors(MOSHEMTs)processed on the heterostructures not only exhibited a high threshold voltage(VTH)of 3.1 V,but also demonstrated a significantly enhanced drain output current density of 669 m A/mm.These values probably represent the largest values obtained from the InAlGaN based enhancement-mode devices to the best of our knowledge.This study strongly indicates that the InAlGaN/GaN heterostructures grown by pulsed metal organic chemical vapor deposition could be promising for the applications of novel nitride-based electronic devices.展开更多
基金Supported by the National Science and Technology Major Project of China under Grant No 2013ZX02308-002the National Natural Sciences Foundation of China under Grant Nos 61574108,61334002,61474086 and 61306017
文摘Nearly lattice-matched InAIGaN/GaN heterostructure is grown on sapphire substrates by pulsed metal organic chemical vapor deposition and excellent high electron mobility transistors are fabricated on this heterostructure. The electron mobility is 1668.08cm2/V.s together with a high two-dimensional-electron-gas density of 1.43 × 10^13 cm-2 for the InAlCaN/CaN heterostructure of 2Onto InAlCaN quaternary barrier. High electron mobility transistors with gate dimensions of 1 × 50 μm2 and 4μm source-drain distance exhibit the maximum drain current of 763.91 mA/mm, the maximum extrinsic transconductance of 163.13 mS/mm, and current gain and maximum oscillation cutoff frequencies of 11 GHz and 21 GHz, respectively.
基金Project supported by the National Postdoctoral Program for Innovative Talents,China(Grant No.BX201700184)the National Key Research and Development Program of China(Grant Nos.2016YFB0400105 and 2017YFB0403102)
文摘Pulsed metal organic chemical vapor deposition was employed to grow nearly polarization matched InAlGaN/GaN heterostructures.A relatively low sheet carrier density of 1.8×10^(12)cm^(-2),together with a high electron mobility of 1229.5 cm^2/V·s,was obtained for the prepared heterostructures.The surface morphology of the heterostructures was also significantly improved,i.e.,with a root mean square roughness of 0.29 nm in a 2μm×2μm scan area.In addition to the improved properties,the enhancement-mode metal–oxide–semiconductor high electron mobility transistors(MOSHEMTs)processed on the heterostructures not only exhibited a high threshold voltage(VTH)of 3.1 V,but also demonstrated a significantly enhanced drain output current density of 669 m A/mm.These values probably represent the largest values obtained from the InAlGaN based enhancement-mode devices to the best of our knowledge.This study strongly indicates that the InAlGaN/GaN heterostructures grown by pulsed metal organic chemical vapor deposition could be promising for the applications of novel nitride-based electronic devices.
