To effectively tolerate a double-node upset,a novel double-node-upset-resilient radiation-hardened latch is proposed in 22 nm complementary-metal-oxide-semiconductor technology.Using three interlocked single-node-upse...To effectively tolerate a double-node upset,a novel double-node-upset-resilient radiation-hardened latch is proposed in 22 nm complementary-metal-oxide-semiconductor technology.Using three interlocked single-node-upset-resilient cells,which are identically mainly constructed from three mutually feeding back 2-input C-elements,the latch achieves double-node-upset-resilience.Using smaller transistor sizes,clock-gating technology,and high-speed transmission-path,the cost of the latch is effectively reduced.Simulation results demonstrate the double-node-upset-resilience of the latch and also show that compared with the up-to-date double-node-upset-resilient latches,the proposed latch reduces the transmission delay by 72.54%,the power dissipation by 33.97%,and the delay-power-area product by 78.57%,while the average cost of the silicon area is only increased by 16.45%.展开更多
基金The National Natural Science Foundation of China(No.61604001)the Doctor Startup Fund of Anhui University(No.J01003217)
文摘To effectively tolerate a double-node upset,a novel double-node-upset-resilient radiation-hardened latch is proposed in 22 nm complementary-metal-oxide-semiconductor technology.Using three interlocked single-node-upset-resilient cells,which are identically mainly constructed from three mutually feeding back 2-input C-elements,the latch achieves double-node-upset-resilience.Using smaller transistor sizes,clock-gating technology,and high-speed transmission-path,the cost of the latch is effectively reduced.Simulation results demonstrate the double-node-upset-resilience of the latch and also show that compared with the up-to-date double-node-upset-resilient latches,the proposed latch reduces the transmission delay by 72.54%,the power dissipation by 33.97%,and the delay-power-area product by 78.57%,while the average cost of the silicon area is only increased by 16.45%.
