1Ohmi T, Saitoh T, Otsuki M, et al. Formation of copper thin film by low kinetic energy particle process. J Electrochem Soc, 1991, 138:1089-1097
2Wang Z Q, Lu S H, Li Y S, et al. Epitaxial growth of metastable modification of copper with body-centered-cubic structure. Phys Rev B, 1987, 35:9322-9325
3Sartwell B D. Influence of ion beam activation on the mode of growth of Cu film on Si(100). J Vac Sci Technol A, 1989, 7:2586-2592
4Kralj M, Pervan P, Milun M. Growth, structure and properties of ultra-thin copper films on a V(110)surface. Surf Sci, 1999, 423:24-31
5Dehm G, Scheu C, Ruhle M, et al. Growth and structure of internal Cu/Al2O3 and Cu/Al2O3 interfaces. Acta Mater, 1998, 46:759-772
6Abe K, Harada Y, Onoda H. Study of crystal orientation in Cu film on TiN layered structures. J Vac Sci Tech B, 1999, 17:1464-1469
7Nagamachi S, Yamakage Y, Ueda M, et al. Focused ion-beam direct deposition of metal thin film. Rev Sci instrum, 1996, 67:2351-2359
8Richter A, Smith R, Lenz H. Growth of biological films. Microscopical investigations and computer simulations. MAT. SCI.& ENG. ERING C, 1999, 8-9:451-462
9Rong F X. Computer simulation of surface growth. Journal of Crystal, 1997,174:531-538
10Djafari R M, Malek R, Esteve D. Monte carlo simulation of mismatch relaxation and island coalescence during heteroepitaxial growth-thin solid films. The Solid Films, 1998, 318:61-64
二级参考文献23
1Kralj M, Pervan E Milun M. Growth, structure and properties of ultra-thin copper films on a V(110) surface. Surf Sci, 1999,423:24-31.
2Dehm G, Scheu C, Ruhle M, et al. Growth and structure of internal Cu/Al2O3 and Cu/Al2O3 interfaces. Acta Mater, 1998, 46:759-772.
3Abe K, Harada Y, Onoda H. Study of crystal orientation in Cu film on TiN layered structures. J Vac Sci Tech B, 1999, 17:1464-1469.
4Nagamachi S, Yamakage Y, Ueda M, et al. Focused ion-beam direct deposition of metal thin film. Rev Sci instrum, 1996, 67:2351-2359.
5Adams J B, Wang Z Y, Li Y. Modeling Cu thin film growth. Thin Solid Films, 2000, 365:201-210.
6Gilmer G H, Hanchen H, Christopher R. Thin film deposition: Fundamentals and modeling. Comp Mat Sci, 1998, 12:354-380.
7Gilmer G H, Hanchen H, Tomas D R, et al. Lattice Monte Carlo models of thin deposition. Thin Solid Films, 2000, 365:189-200.
8Battailr C C, Srolovitz D J. A kinetic Monte Carlo method for the atomic-scale simulation of chemical vapor deposition:Application to diamond. J Appl Phys, 1996, 82:6293--6300.
9Wang L G, Clancy E Kinetic Monte Carlo simulation of the growth of polycrystalline Cu film. Surf Sci, 2001,473:25-38.
10Bruschi E Cagnoni E Nannini A. Temperature-dependent Monte Carlo simulation of thin metal film growth and percolation.Phys Rev B, 1997, 55:7955-7963.
8OHMI T, SAITOH T, OTSUKI M, et al. Formation of copper thin film by low kinetic energy particle process[J]. J Electrochem Soc, 1991, 138(5): 1089-1097.
9WANG Z Q, Lu S H, LI Y S, et al. Epitaxial growthof metastable modification of copper with body-centered-cubic structure[J]. Phys Rev B, 1987, 35(5-6): 9322-9325.
10SARTWELL B D. Influence of ion beam activation on the mode of growth of Cu film on Si(100)[J]. J Vac Sci Technol A, 1989, 7(2): 2586-2592.
