摘要
采用自行设计的微波等离子体化学气相沉积系统,利用铜网作为模板实现了在sj(100)衬底上金刚石膜的选择沉积。用场发射扫描电子显微镜(SEM)、Raman散射谱对样品进行了表征与分析。并与同样生长条件下未采用模板时得到的金刚石样品进行了比较。结果发现,采用模板后,金刚石膜的成核密度和质量都得到很大提高。
Diamond films were selectively deposited on Si (100) substrates by the microwave plasma chemical vapor deposition system (MPCVD) . The copper mesh was used as template to realize the selective deposition. The films were characterized by high resolution scanning electron microscopy and Raman scattering spectroscopy. Under the same growth conditions, the diamond films deposited on silicon substrate without copper mesh were also studied. It was found that the nucleation density and the quality of the films are improved greatly using copper mesh as template.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2003年第6期610-612,共3页
Journal of Synthetic Crystals
