摘要
研究了真空退火对TbCo薄膜结构和磁性能的影响。结果表明:薄膜从溅射态的非晶薄膜转化为退火态的微晶薄膜,并以(100)面择优取向,其c轴平行于基片。在真空退火不改变TbCo薄膜的成分的条件下,发现TbCo薄膜从溅射态的垂直磁化膜转化为退火态的面内膜。
The magnetic properties and structures of sputtered and annealed TbCo thin films have been studied. The results show that the film will be changed from the amorphous to the polycrystalline, and oriented with (100) plane. The contents of Tb and Co for the film are not almost changed after vacuum annealing, and a change of the easy axis of the film from out-of-plane to in-plane is found.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2003年第5期361-363,共3页
Rare Metal Materials and Engineering
基金
SupportedbytheFoundationforUniversityKeyTeacherbytheMinistryofEducationofChinaandtheFoundationofNaturalScienceofShanxiProvince.
关键词
退火
磁性能
TbCo薄膜
annealing
magnetic properties
TbCo thin films
