摘要
国内采用脉冲电源进行PCVD沉积TiN膜，尚未见报道。本文主要介绍脉冲PCVD沉积TiN膜的若干特点，并与直流PCVD作了比较。试验表明脉冲PCVD能降低TiN的沉积温度．细化晶粒．减小膜层中的氯含量，改善成膜质量，与直流PCVD相比．能进一步提高工模具寿命。
This paper describes somc characteristics about the pusled PCVD depositing TiN film. Compares pusled PCVD with D. C. PCVD. The experiment results show that pulsed PCVD would decrease the depositing temperature, reduced the chlorine content in the film, fine erystal of TiN and improve quality of TiN film.Thereforc the pulsed PCVD would increase the service lifc of dies and tools more than D. C. PCVD
出处
《表面工程》
CSCD
1996年第1期1-6,共6页
