摘要
介绍了100mm口径反应烧结碳化硅平面反射镜的光学加工工艺流程。按照流程依次介绍了在粗磨成形、细磨抛光和精磨抛光过程中使用的机床、磨具和磨料以及采用的工艺参数和检测方法。介绍了在光学加工各个步骤中应注意的问题。展示了加工后反应烧结碳化硅平面反射镜的实物照片。给出了面形精度和表面粗糙度的检测结果:面形精度(95%孔径)均方根值(RMS)为0.030λ(λ=632.8nm),表面粗糙度RMS值达到了1.14nm(测量区域大小为603 6μmⅹ448 4μm)。
ptical surfacing process of 100mm flat reactionburned SiC mirror is mentioned. The machine, tools, abrasives, technology and testing method used in the grinding and polishing are introduced, respectively. Some testing results of surface figure and surface roughness are given. The result shows that the surface figure is 0.030 wavelength (λ=632.8nm), and rootmeansquare the surface roughness is 1.14nm (measure area = 603.6μmⅹ448.4μm ). And the photograph of the mirror is also showed.
出处
《光学技术》
CAS
CSCD
2003年第6期667-668,674,共3页
Optical Technique
基金
国家杰出青年基金资助项目(69925512)
