摘要
In order to investigate the mechanism of mutation induced by ultralow energy heavy ions, range distribution of the ions implanted into embryo of wheat seed was measured. 110 keV 56Fe1+ ions supplied by 200 kV ion implanter of IMP were used to implant right into embryo of dry wheat seeds (cultivar 14615). Ion density was 5×l016/cm2. Ion beam intensity was about 3μ,A. Cross-section of scanned beams was 55×55 mm and its homogeneity was better than 95%.
