摘要
针对全息离子束刻蚀衍射光栅制作中,光刻胶光栅浮雕图形的制作是至关重要和困难的,引入O2反应离子刻蚀对光刻胶光栅进行灰化处理,给出光刻胶灰化技术在全息离子束刻蚀衍射光栅制作闪耀光栅、浅槽矩形位相光栅、自支撑透射光栅中的具体应用。实验结果表明,这一新工艺的突出优点是降低了苛刻的全息曝光、显影要求,使得光栅线条光滑、线空比和槽深可控。
A novel technique has been successfully developed, in which oxygen reactive ions etching was used to achieve photo-resist ashing of the grating, to fabricate diffraction grating with holographic ion beam etching. The new technique was used to fabricate blazed gratings, laminar gratings and self-supporting transmission gratings.The results show that the new technique can considerably lower the stringent requirements of holographic exposure and development,and makes it controllable to make smooth grooves with desirable depth and duty cycles.
出处
《真空科学与技术》
EI
CAS
CSCD
北大核心
2003年第5期362-364,372,共4页
Vacuum Science and Technology
关键词
光刻胶灰化
离子束刻蚀
衍射光栅
Photoresist-ashing
Ion beam etching
Diffraction gratings
