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PREPARATION AND PROPERTIES OF Ni-Cr AND Fe-Cr-Al FILMS BY VACUUM EVAPORATION

PREPARATION AND PROPERTIES OF Ni-Cr AND Fe-Cr-Al FILMS BY VACUUM EVAPORATION
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摘要 Ni-Cr and Fe-Cr-Al films deposited on the Al2O3 substrate are studied by a method of vacuum evaporation in this paper. Influence of resistance value on density and evaporation parameters of the films reveals that the resistance of films and the adhesion of films to substrates are determined by the evaporation time and the substrate temperate under the condition of the maximum vacuity of 6.2×10-4 Pa, respectively. Ni-Cr and Fe-Cr-Al films deposited on the Al2O3 substrate are studied by a method of vacuum evaporation in this paper. Influence of resistance value on density and evaporation parameters of the films reveals that the resistance of films and the adhesion of films to substrates are determined by the evaporation time and the substrate temperate under the condition of the maximum vacuity of 6.2×10-4 Pa, respectively.
出处 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2003年第4期283-288,共6页 金属学报(英文版)
关键词 vacuum evaporation resistance of film vacuity vacuum evaporation, resistance of film, vacuity
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参考文献5

  • 1M.B. Tian and D.L. Liu, Handbook of Films Science & Technology (First Volume, Machinery Industry Publisher. Beiiing, 1991) p.1 (in Chinese).
  • 2B.C.Yang and W.X. Wang, Films Physics & Technology (Press of the University of Electronic Science & Technology, Chengdu, 1994) p.17 (in Chinese).
  • 3J. George, Preparation of Thin Films (Marcel Dekker Inc., New York, 1992) p.1.
  • 4X.X. Qu, Thin Films Physics (Shanghai Science & Technology Publisher, Shanghai, 1986) p.25 (in Chinese).
  • 5X.X. Qu and B.J. Guo, Thin Films Physics (Electronic Industry Press, Beijing, 1994) p.56 (in Chinese).

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