期刊文献+

PCM参数的多元回归模型及其应用

Multivariate Regression Model of PCM Parameters and Its Application
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摘要  介绍了建立工艺监控模块(PCM)参数数值模型的多元回归方法。多元回归是一种多元统计的处理方法,由该方法得到的一组数值模型中的每一个,都能够与数据源良好拟合。利用单值模拟器,取得了统计性的模拟结果,应用多元回归法得到了回归模型,它在一定范围内能有效地替代耗时的数值模拟。该方法可广泛应用于IC工艺开发、优化、诊断和电子制造自动化等方面。 A multivariate regression method to build statistic models for PCM parameters is presented,which is one of the multivariate statistical methods Each of the models obtained with this method can fit very well with the source data The proposed method is especially suitable for complicated systems,such as VLSI manufacturing system Statistical results are obtained from the simulator that gives a definite value The models obtained can be used efficiently,to a certain extent,to replace the time consuming numerical simulations So,the method is useful in developing,optimizing,and diagnosing VLSI processes,and in manufacture automation
出处 《微电子学》 CAS CSCD 北大核心 2003年第4期309-312,共4页 Microelectronics
关键词 PCM 工艺监控模块 多元回归模型 集成电路 电子制造 PCM(Process Control Module) Multivariate regression Process simulation Device simulation
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参考文献3

  • 1于秀林.多元统计分析及程序[M].北京:中国统计出版社,1993.18-40.
  • 2Williams S, Varahramyan K. A new TCAD-based statistical methodology for the optimization and sensitivity analysis of semiconductor technologies [J].IEEE Trans Semiconductor Manufacturing, 2000; 13(2) :208-218.
  • 3Singhal K, Visvanathan V. Statistical device models from worst case files and electrical test data [J].IEEE Trans Semiconductor Manufacturing, 1999; 12(4) : 470-484.

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