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PIN管正偏注入的载流子在Ⅰ层中分布的研究 被引量:1

Study on Distribution of Injected Carrier Densities in the I-Layer of a Forward Biased PIN Diode
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摘要 本文认为,Ⅰ层中不会有电子浓度和空穴浓度处处相等的电中性近似,这两种浓度都要随扩散距离的增加而衰减.本文用准中性条件来求解电子和空穴的连续性方程,导出这两种浓度都按扩散距离的负指数函数在Ⅰ层中分布.这样,其载流子一载流子散射效应可忽略不计,其俄歇复合较小,比用电中性近似求得的载流子分布的俄歇复合要小许多倍. This paper thinks that. there is no charge neutrality approximation in the I-layer wherever the electron density is equal to the hole density. These two kinds of densities in the I-layer of a forward biased PIN diode will be decreased with the increasing of the diffusion distance. We use the quasi-neutrality condition to solve continuity equations of the electron and hole densities and obtain the electron and hole density distributions in the I-layer which are the negative exponential function of the diffusion dis- tance. The effect of the carrier-carrier scattering may then be neglected and the Auger recombination is much less than that of the carrier distribution obtained by using the neutrality approximation.
作者 张益才
出处 《湖南大学学报(自然科学版)》 EI CAS CSCD 1992年第2期80-85,99,共7页 Journal of Hunan University:Natural Sciences
关键词 PIN二极管 载流子注入 电子浓度 electron density hole carrier injection/PIN diode charge neutrality approximation quasi-neutrality condition
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  • 2刘恩科,朱秉升,罗晋升.半导体物理学[M].第4版.北京:国防工业出版社.2010.
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