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原子荧光光谱法测定涂料中痕量砷和锑的研究 被引量:1

Simultaneous determination of trace arsenic and antimony in coatings by hydride generationatomic fluorescence spectrometry
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摘要 采用氢化物发生原子荧光光谱法,以L半胱氨酸为预还原剂,对涂料中痕量的砷和锑进行了测定,讨论并确定了实验的最佳测定条件.最佳条件下的测定结果表明:砷和锑的检出限分别为0.058μg/L和0.075μg/L,回收率为98.5%~100.3%,相对标准偏差分别为0.6%和0.9%.该法准确、快速、简便,应用于涂料中砷和锑的测定,结果满意. A method for the determination of trace arsenic and antimony in coatings by hydride generation atomic fluorescence spectrometry(HGAFS) has been described.In this method,As and Sb were prereduced by Lcysteine.The influence of HGAFS operation conditions,acidic media and concentration of KBH4 solution have been studied.The detection limits of As and Sb are 0.058 and 0.075 μg/L respectively.The recoveries of the method were 98.5%~100.3% and with precision of 0.6%~0.9% RSD(n=11).This method is accurate,quickacquired and convenient.It can be used in the determination of trace arsenic and stibium in coatings with satisfactory result.
出处 《武汉化工学院学报》 2003年第1期11-12,17,共3页 Journal of Wuhan Institute of Chemical Technology
关键词 氢化物发生-原子荧光 L-半胱氢酸 原子荧光光谱法 测定 涂料 痕量 研究 Arsenic Stibium hydride generationatomic fluorescence spectrometry Lcysteine coatings
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