摘要
叙述了光刻技术在微电子、光学仪器制造中的发展情况,同时,介绍了近几年发展起来的立体光刻原理。
In this paper, the development of the lithography in the fields of microelectronics and optical instrument mamufacture is descripted. At the same time, the principle of the stereo lithography, which is being developed recently, is introduced.
出处
《光学仪器》
1992年第3期29-32,共4页
Optical Instruments
关键词
光刻
激光
立体光刻
Lithography, Laser, Stereo lithography
