摘要
本文报道—台自制的光学投影亚微米量级微细加工用的KrF准分子激光振荡-放大系统,并对其设计和运转性能加以讨论.该系统在200Hz重复率运转时其谱线漂移小于5×10^(-4)nm,谱线宽度为2.3×10^(-8)nm,平均功率达24.4W.
A KrF resonator-amplifier excimer laser system using for submicro fine processing was reported. This system can operate in the situation of 200 Hz repetition rate with output power of 24.4 W and spectrum of 2.3 ×10-3 nm. Its spectrum drift is less 5×10-4 nm during operation.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1992年第6期511-515,共5页
Acta Optica Sinica
关键词
高功率
高重复率
准分子激光器
high power, high repetition rate, excimer laser.
