摘要
A reverse bias silicon p-n junction based on light emitting diode is designed in standard 0.6μm industrial CMOS technology.The mechanism of the light emitting of this device is discussed.The device is simulated by the commercial software.I-V characteristic under forward or reverse bias is simulated utilizing the commercial software.The results between simulation and experiment data are compared.The results show that it is a promising device and may find applications in light linking.
采用工业标准 0 6 μmCMOS工艺设计了以反向击穿硅 p n结为基础的光发射器件 .讨论了该器件的光发射机理 .利用商业模拟软件对器件的工作特性进行了模拟 ,包括器件的正向和反向I V特性、p区掺杂浓度对击穿电压的影响以及门电压对器件发光强度的调制特性的影响等 .结果表明该器件是一种很有前途的硅发光器件 ,在光互连等领域具有广阔的应用前景 .
基金
国家高技术研究发展计划 (批准号 :2 0 0 1AA312 0 80,2 0 0 2AA312 2 40,2 0 0 1AA12 2 0 32 )
国家自然科学基金 (批准号 :6 9896 2 6 0 )资助项目 ~~
