摘要
介绍了用反射干涉频谱法测量透明或半透明薄膜表面平整度的方法 ,薄膜厚度的测量范围约在 0 2～ 2 0 μm(小于 2 0μm)之间 .在对二氧化硅薄膜的测试中 ,该测试方法与椭圆偏振仪的测试结果相比较 ,其纵向测量误差小于 2nm .通过光纤传感器在薄膜上的移动 ,对薄膜上各点的反射光谱进行分析 ,得到各点的厚度 .通过步进电机的移动 ,连续测量膜上不同点的厚度 ,从而获得薄膜的表面形貌 .该方法对薄膜无破坏作用 ,且无需测量干涉条纹 ,与其他的非接触式测试方法相比较 ,具有无横向测试范围限制、测试系统结构简单、测试精度高、测试结果可靠的特点 。
A method to detect surface roughness by reflected interference pattern of transparent (or semitransparent) film is introduced, whose thickness testing range is from 0.2 micron to less than 20 micron. In the testing for silicon dioxide film, the thickness testing error is within 2 nm compared with the results obtained from ellipsometry. Moving on a film, an optical fiber sensor can be used to get the thickness value of different points on the film surface by analyzing the reflected interference pattern. With the help of step motor, the film surface roughness is detected through continuous measurement to the thickness of different points on the film. This technique has the advantages over the other non-contact detecting ones due to it has no limit on transverse testing range and its quite simple system.
出处
《西安交通大学学报》
EI
CAS
CSCD
北大核心
2003年第3期314-317,共4页
Journal of Xi'an Jiaotong University
基金
教育部教育"振兴计划"资助项目
