摘要
测量了含钕及不含钕两种钛合金5621S于600-800℃在氧气中氧化条件下氧化膜的生长应力和于800℃氧化不同时间后氧化膜的残余应力。通过氧化膜的生长应力、热应力、残余应力大小的比较,表明Ti5621S合金中添加钕能降低氧化膜的生长应力。含钕及不含钕两种钛合金氧化膜的生长应力和热应力同数量级。于冷却过程中若钛合金5621S氧化膜发生显著破裂,由于应力充分释放,其残余应力反较含钕的钛合金5621S氧化膜的低。
The growth stresses of oxide scales formed on Ti5621S and Nd doped Ti5621S alloys during the oxidation at 600—800℃ in oxygen and the residual stresses of the oxide scale formed at 800℃ at diffierent time have been measured using the one side oxidation bending method and X-ray diffraction respectively. The results indicate that Nd addition can decfease the growth stresses of the oxide scales. The growth stress are in the same order with the thermal stresses of the oxide scales on two Ti5621S alloys.If cracking of the oxide scale on Nd free Ti5621S alloy occurs obviously during the cooling,its residual stress is smaller than hat of the oxide scale on Nd doped Ti5621S alloy due to releasing.
出处
《腐蚀科学与防护技术》
CAS
CSCD
1992年第2期92-95,共4页
Corrosion Science and Protection Technology
基金
国家自然科学基金
关键词
钛合金
钕
氧化膜
应力
高温氧化
tress in oxide scale, residual stress, RE Nd, Ti5621S alloy, high temperature oxidation
