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石墨氧化物分子沉积膜的制备及其摩擦学行为研究 被引量:13

The Preparation of Graphite Oxide Molecular Deposition Films and Its Study by Atomic Force Microscopy
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摘要 采用分子沉积技术制备了石墨氧化物 (GO) -聚二丙烯二甲铵 (PDDA)多层超薄膜 ,用紫外和红外光谱对超薄膜的结构进行了分析 ,用原子力显微镜考察了薄膜的表面形貌及纳米摩擦学行为 .结果表明 :石墨氧化物分子沉积膜可以降低玻璃表面的摩擦系数 ;其摩擦系数随载荷增大而降低 ; The graphite oxide poly (diallyldimethyammonium chloride) ultra thin film was prepared by molecular deposition technology. Its structure was analyzed using an ultraviolet spectrometer and a Fourier transformation infrared spectrometer. The morphology and nanotribological properties of the film were investigated using an atomic force microscope. As the results, the GO PDDA ultra thin film obviously lowered the friction coefficient of the glass substrate, which might be attributed to the lower shear strength of the film as compared with that of the glass. The friction coefficient of the film decreased with increasing load, while the increase of the surface roughness of the film with different layer numbers led to increased friction coefficient.
出处 《摩擦学学报》 EI CAS CSCD 北大核心 2003年第1期1-4,共4页 Tribology
基金 国家自然科学基金资助项目 (5 0 175 0 76) 中国博士后科学基金资助项目 (2 0 0 2 0 3 1116)
关键词 石墨氧化物 分子沉积膜 纳米摩擦学性能 AFM graphite oxide molecular deposition film nanotribological behavior AFM
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