摘要
本文应用电子显微镜研究了PVA在H_2Q存在下的氧化降解机理,并对PVA降解前后的微观结构变化进行了观察。结果表明:高聚物PVA在有光敏剂(H_2Q)存在下,能引发PVA产生降解,其降解机理是按自由基连锁反应过程进行的,降解后的低聚合度PVA的微结构形态也与降解前不同。
Oxidative degradation mechanism of hydroquincne(H2Q)exist in polyvinyl alcohol(PVA) were studied with electron microscope in this paper. Microstructure chang of high degree of polymerization PVA and after degradation were observed. The results indicate:It can be initiate PVA degradation when photosensitizer (H_2Q)exist in high polymers PVA. Degradation mechanism is according to free radical chain reaction process. Microstructure morphology of low degree of polymerization PVA degradation before and after is not the same.
出处
《电子显微学报》
CAS
CSCD
1992年第3期212-215,共4页
Journal of Chinese Electron Microscopy Society
关键词
聚乙烯醇
氢醌
光敏剂
氧化降解
Polyvinyl Alcohol(PVA)
Hydroquincne(H_2Q):Photosensitizer:Free radical chain reaction mechanism
