摘要
本文针对柔性有机发光二极管中偏光片在湿热环境下出现的褪色问题,研究了等离子体增强化学气相沉积(PECVD)制备氮化硅薄膜工艺中的关键影响因素。通过全因子实验设计,系统分析了射频功率和电极间距对薄膜性能与偏光片褪色行为的作用机制。研究结果表明,射频功率(P=0.006)与电极间距(P=0.023)均为偏光片褪色的显著性影响因子,褪色程度与射频功率呈负相关,与电极间距呈正相关,所建立的线性模型可解释89.88%的变异。薄膜应力与偏光片褪色之间无显著统计关联(P=0.169),表明两者均为工艺参数的并行响应变量。氮化硅薄膜中氮氢键和硅氢键的键合氢含量与偏光片褪色呈强正相关(P=0.007,R2=79.1%)。电压峰峰值作为等离子体解离能力的关键指标,与键合氢含量呈显著负相关(P=0.015)。提高射频功率与减小电极间距可显著提升电压峰峰值,进而有效降低氮化硅薄膜中键合氢含量,促进形成更致密稳定的薄膜结构,从而减少氮化硅薄膜在湿热环境下氧化劣化释放的氨气,减少其进一步与偏光片中的碘离子发生反应,最终达到抑制偏光片褪色的效果,显著提升柔性有机发光二极管在湿热环境下的可靠性。
This study investigates the key factors in the plasma-enhanced chemical vapor deposition(PECVD)process for silicon nitride(SiNₓ)films to address the polarizer(POL)bleaching issue in flexible organic light-emitting diodes(OLEDs)under damp-heat conditions.A full factorial design of experiments was employed to systematically analyze the effects of radio frequency(RF)power and electrode spacing on film properties and polarizer bleaching behavior.The results demonstrate that both RF power(P=0.006)and electrode spacing(P=0.023)are significant factors affecting polarizer bleaching.The degree of bleaching exhibits a negative correlation with RF power and a positive correlation with electrode spacing,with the established linear model explaining 89.88%of the variation.No significant statistical association was found between film stress and polarizer bleaching(P=0.169),indicating that both are parallel responses to process parameters.The total bonded hydrogen content(N—H and Si—H bonds)in SiNₓfilms shows a strong positive correlation with polarizer bleaching(P=0.007,R2=79.1%).As a key indicator of plasma dissociation capability,the voltage peak-to-peak(Vpp)value shows a significant negative correlation with bonded hydrogen content(P=0.015).Increasing RF power and reducing electrode spacing significantly enhance Vpp,thereby effectively reducing the total bonded hydrogen content in SiNₓfilms and promoting the formation of a denser,more stable film structure.This reduction in bonded hydrogen content decreases the amount of ammonia released through oxidative degradation of SiNₓfilms under damp-heat conditions,consequently minimizing its reaction with iodine ions in the polarizer and ultimately inhibiting polarizer bleaching.These findings significantly enhance the reliability of flexible OLEDs in damp-heat environments.
作者
王志强
谈耀宏
孙文
赵吾阳
孙福坤
WANG Zhiqiang;TAN Yaohong;SUN Wen;ZHAO Wuyang;SUN Fukun(Mianyang BOE Optoelectronics Technology Co.Ltd.,Mianyang 621000,China)
出处
《液晶与显示》
北大核心
2025年第12期1800-1809,共10页
Chinese Journal of Liquid Crystals and Displays
关键词
偏光片褪色
离子体增强化学气相沉积
氮化硅
射频功率
电极间距
键合氢含量
电压峰峰值
polarizer bleaching
plasma enhanced chemical vapor deposition
silicon nitride
RF power
electrode spacing
bonded hydrogen content
voltage peak-to-peak
