摘要
近年来,化学气相沉积(Chemical Vapor Deposition,CVD)技术由于其所具有的在成膜均匀性、成膜致密性以及成膜保形性等方面的优势被广泛地应用于铁基薄膜材料制备领域。CVD过程实现的关键在于前驱体,然而目前所报道铁前驱体仍然存在一些不足,因此仍需发展新型的铁前驱体用于通过CVD技术制备铁基薄膜材料。基于此,本文对四乙基乙二胺Fe(Ⅱ)氯化物[FeCl_(2)(TEEDA)]作为CVD前驱体制备铁基薄膜材料的应用性能进行了研究。首先通过热重分析法(TGA)对该化合物的热性质进行了测定分析,结果表明该化合物的热失重过程为一阶失重,残余质量为12.7%;然后以该化合物为前驱体,以O_(2)为反应气,通过CVD技术成功制备出α-Fe_(2)O_(3)薄膜材料,且成膜连续均匀,具有较高的纯度。
In recent years,chemical vapor deposition(CVD)technology has been extensively applied in preparation of iron-based thin films materials owing to its obvious advantages in film uniformity,compactness,and conformality.Precursor plays a key role in a CVD process,while various drawbacks still exist in the reported iron precursors.Therefore,it is necessary to develop new type iron precursor for preparing iron-based films through CVD technology.Based on this,the applicability of tetraethyl-1,2-ethylendiamine iron(Ⅱ)chloride[FeCl_(2)(TEEDA)] as a CVD precursor for iron-based film was studied.The thermal properties of the synthesized compound were studied by thermogravimetric analysis(TGA)first,and the result indicated that FeCl_(2)(TEEDA)volatilized in a single step with residual mass remaining(12.7%).Then continuous,smooth,and high purityα-Fe,0,film was successfully deposited using FeCl_(2)(TEEDA)as CVD precursor and O_(2)as reaction gas,respectively.
作者
孙国富
徐静莉
刘笑涵
叶绪胤
张羽翔
SUN Guo-fu;XU Jing-li;LIU Xiao-han;YE Xu-yin;ZHANG Yu-xiang(College of Chemical and Materials Engineering,Xuchang University,Xuchang 461000,China)
出处
《化学研究与应用》
北大核心
2025年第11期3486-3490,共5页
Chemical Research and Application
基金
国家自然科学基金项目(22276160)资助
河南省科技攻关项目(222102230083)资助。
关键词
四乙基乙二胺Fe(Ⅱ)氯化物
热性质
化学气相沉积
前驱体
铁基薄膜
tetraethyl-1,2-ethylendiamine iron(Ⅱ)chloride
thermal properties
chemical vapor deposition
precursor
iron-based films
