摘要
NiO作为一种新型宽禁带空穴传输材料,具有优异的光学、电学特性。本文采用溶胶凝胶法制备Er掺杂NiO薄膜,通过改变退火温度和Er掺杂浓度,对比探究热处理对NiO薄膜结构与光电特性的影响。研究表明,随着退火温度从300℃提升至600℃,NiO薄膜结晶性与可见光透过率增加,在500℃退火温度下具有最低的电阻率;随着Er掺杂浓度从2%提升至10%,NiO薄膜缺陷减少,晶粒尺寸增加,上转换发光性能呈先增加后降低的趋势,上转换和电学性能在Er掺杂量为8%时性能最佳。本研究优化制备的8%Er掺杂NiO薄膜,在500℃退火2 h具有最高上转换发光强度,最低电阻率为177.6Ω·cm,最高迁移率0.48 cm^(2)·V^(-1)·s^(-1)。本文从光谱转换和空穴传输层材料性能优化两个方面,为提升钙钛矿和硅基太阳电池光电转换效率的研究提供部分理论和实验依据。
As a new type of wide band gap hole transport material,NiO has excellent optical and electrical properties.Er doping NiO thin films were prepared by sol-gel method.The effects of annealing temperature and Er doping concentration on the structure and photoelectric properties of NiO thin films were investigated by changing the annealing temperature and Er doping concentration.The results show that crystallinity and visible light transmittance of NiO thin films increase with the increase of annealing temperature from 300℃to 600℃,and the resistivity is the lowest at 500℃annealing temperature.With the increase of Er doping concentration from 2%to 10%,the defects of NiO thin films decrease,the grain size increases,and the upconversion luminescence performance increases first and then decreases.The upconversion and electrical properties are the best when the Er doping concentration is 8%.The 8%Er doping NiO film optimized has the highest upconversion luminescence intensity after annealing at 500℃ for 2 h.The lowest resistivity is 177.6Ω·cm and the highest mobility is 0.48 cm^(2)·V^(-1)·s^(-1).This paper successfully provides some theoretical and experimental basis for improving the photoelectric conversion efficiency of perovskite and silicon-based solar cells from two aspects of spectral conversion and hole transport layer material performance optimization.
作者
姚函妤
陈楷
易雨薇
周延琪
李霜
唐群涛
YAO Hanyu;CHEN Kai;YI Yuwei;ZHOU Yanqi;LI Shuang;TANG Quntao(School of Materials Science and Engineering,Nanjing Institute of Technology,Nanjing 211167,China;College of Mechanical&Electrical Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 211100,China;School of Physics,Nanjing University of Aeronautics and Astronautics,Nanjing 211100,China)
出处
《人工晶体学报》
北大核心
2025年第9期1622-1632,共11页
Journal of Synthetic Crystals
基金
国家自然科学基金青年科学基金(52102263,62104160)
面向苛刻环境的材料制备与防护技术工业和信息化部重点实验室项目(1006-KFA22156)。
关键词
NiO薄膜
Er掺杂
溶胶凝胶法
热处理
光学性能
电学性能
NiO thin film
Er doping
sol-gel method
heat treatment
optical property
electrical property
