摘要
采用电弧离子镀技术和高功率脉冲磁控溅射复合方法,在M2高速钢和单晶硅片上沉积TiZrN/TiN纳米多层膜。研究脉冲偏压幅值对TiZrN/TiN纳米多层膜微观结构、元素成分、相结构、膜基结合力、纳米硬度、摩擦磨损性能和耐腐蚀性能的影响规律。研究发现,随着脉冲偏压幅值的增加,在脉冲偏压幅值为–500 V时薄膜粗糙度减小到0.345μm,薄膜厚度呈波动变化的趋势,TiZrN/TiN纳米多层膜的择优取向从(111)晶面转变为(220)晶面。当脉冲偏压幅值为–200 V时,TiZrN/TiN纳米多层膜与基体的结合力等级为HF2;薄膜的纳米硬度和弹性模量分别增加到47.02 GPa和382.28 GPa,硬度是高速钢基体(~9 GPa)的5.2倍;摩擦磨损测试结果表明,此时薄膜的耐磨损性能较好,磨损率降低到4.38×10^(-8)mm^(3)·N^(-1)·m^(-1);同时电化学腐蚀测试发现TiZrN/TiN纳米多层膜的自腐蚀电流密度降到最低0.566μA/cm^(2),约为高速钢基体(9.654μA/cm^(2))的1/17,薄膜腐蚀速率最慢。采用电弧离子镀和高功率脉冲磁控溅射复合方法,可以减小薄膜表面粗糙度;通过调控脉冲偏压幅值,改变离子能量,TiZrN/TiN纳米多层膜的硬度、耐磨损和耐腐蚀性能相较于高速钢基体有显著提升。
TiZrN/TiN nano-multilayer films were deposited by hybrid method of arc ion plating and high-power impulse magnetron sputtering techniques on M2 high-speed steel and single crystal silicon substrates.The microstructure,element composition,phase structure,adhesion strength between the film and substrate,nanohardness,friction and wear properties and corrosion resistance of TiZrN/TiN nano-multilayer films were investigated.Results show that with the increase in pulsed bias voltage,the surface roughness of TiZrN/TiN nano-multilayer films is decreased to 0.345μm when the pulsed bias voltage is–500 V,and the thickness of the films exhibits a fluctuant trend.The preferred orientation of TiZrN/TiN nano-multilayer films shifts from(111)crystal plane to(220)crystal plane.At a pulsed bias voltage of–200 V,the adhesion strength level between TiZrN/TiN nano-multilayer films and substrate reaches to HF2.The nanohardness and elastic modulus of the TiZrN/TiN nanomultilayer film are increased to 47.02 GPa and 382.28 GPa,respectively.The hardness is 5.2 times higher than that of M2 high-speed steel substrate(about 9 GPa).At the pulsed bias voltage of–200 V,the wear rate reaches 4.38×10^(-8)mm^(3)·N^(-1)·mm^(-1),which indicates that the TiZrN/TiN nano-multilayer films have good wear resistance.The electrochemical corrosion test shows that the self-corrosion current density of TiZrN/TiN nano-multilayer films reaches the minimum value of 0.566μA/cm^(2),which is approximately 1/17 of that of the high-speed substrate(9.654μA/cm^(2)),and the film exhibits the slowest corrosion rate.Using the hybrid method of arc ion plating and high-power impulse magnetron sputtering can reduce the surface roughness of TiZrN/TiN nano-multilayer films.With the increase in pulsed bias voltage,the ion energy can be changed,which significantly enhances the hardness,wear resistance,and corrosion resistance of TiZrN/TiN nano-multilayer films compared with those of the M2 high-speed steel substrate.
作者
魏永强
张晓晓
张华森
顾艳阳
刘畅
吕怿东
韦春贝
钟素娟
Wei Yongqiang;Zhang Xiaoxiao;Zhang Huasen;Gu Yanyang;Liu Chang;Lv Yidong;Wei Chunbei;Zhong Sujuan(School of Mechanical Engineering,Zhengzhou University of Aeronautics,Zhengzhou 450046,China;Guangdong Provincial Key Laboratory of Modern Surface Engineering Technology,National Engineering Laboratory of Modern Materials Surface Engineering Technology,State Key Laboratory of Special Materials Surface Engineering,Institute of New Materials,Guangdong Academy of Sciences,Guangzhou 510651,China;Zhengzhou Research Institute of Mechanical Engineering Co.,Ltd,Zhengzhou 450001,China)
出处
《稀有金属材料与工程》
北大核心
2025年第9期2384-2394,共11页
Rare Metal Materials and Engineering
基金
国家自然科学基金(51401182)
中国国家留学基金(CSC202108410274)
河南省自然科学基金(242300420053)
河南省高层次人才国际化培养资助项目
广东省基础与应用基础研究基金(2024A1515010753)
新型钎焊材料与技术国家重点实验室开放课题(SKLABFMT-2023-09)
郑州航空工业管理学院科研团队(23ZHTD01010)
青年科研基金支持计划专项(24ZHQN01010)
重点重大项目成果培育与转化专项。
关键词
脉冲偏压幅值
电弧离子镀
高功率脉冲磁控溅射
耐磨性
耐腐蚀性能
pulsed bias voltage
arc ion plating
high-power impulse magnetron sputtering
wear resistance
corrosion resistance
