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磁控溅射脉冲电流密度对车用TiAlSiN涂层性能的影响

Effect of Magnetron Sputtering Pulse Current Density on TiAlSiN Coating Properties of Tool Surface
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摘要 为了提高车用TiAlSiN涂层的沉积质量,通过应用脉冲磁控溅射方法探讨了不同峰值靶电流下碰撞粒子脱靶过程与TiAlSiN涂层的组织形态及其力学特性。研究结果表明,采用磁控溅射法获得粒径在200nm以下的TiAlSiN涂层,随着脉冲电流强度的增加,颗粒间的间隙逐渐减小,显著增加涂层的致密性。TiAlSiN涂层机械性能随脉冲电流密度增大而得到改善,增加脉冲电流密度有助于改善结合性能,获得理想的机械强度及抗弹性变形能力。 In order to improve the deposition quality of TiAlSiN coating,the off-target process of colliding particles and the microstructure and mechanical properties of TiAlSiN coating were investigated by pulsed magnetron sputtering.The results show that the TiAlSiN coating with particle size below 200 nm was obtained by magnetron sputtering.With the increase of pulse current intensity,the gap between particles decreases gradually,which significantly increases the density of the material.The mechanical properties of TiAlSiN coating are improved with the increase of pulse current density,which is helpful to improve the binding properties and obtain the ideal mechanical strength and elastic deformation resistance.
作者 汪福杰 Wang Fujie(School of Automotive Engineering,Henan Industry and Trade Vocational College,Zhengzhou Henan 451191,China)
出处 《山西冶金》 2025年第7期28-29,41,共3页 Shanxi Metallurgy
基金 河南省高等学校重点科研项目(25B460034) 河南省高等教育教学改革研究与实践项目(2024SJGLX0750)。
关键词 TiAlSiN涂层 脉冲电场 电流密度 力学性能 TiAlSiN coating pulsed electric field current density mechanical properties
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