摘要
半导体工艺与技术的飞速发展促使集成电路制造的器件尺寸不断缩小,对环境及原材料污染控制的要求愈发严格。随着半导体制造技术迈向纳米级,电子化学品的纯度要求持续提升,检测杂质水平也从μg/L降至pg/L级别。在半导体器件制造中,痕量杂质元素及污染控制是关键环节,这些杂质可能来源于晶圆基板或电子化学品试剂,尤其是金属离子和纳米颗粒,会对器件性能和产量产生负面影响。因此,制造工厂需采用高纯度化学试剂并严格控制杂质污染。电感耦合等离子体质谱(ICP-MS)凭借其高灵敏度、多元素同时检测能力以及对复杂基质的良好耐受性,已成为高纯电子化学品杂质检测的首选技术之一。近年来,ICP-MS技术不断创新,特别是三重四极杆串联ICP-MS(ICP-QQQ)的出现,进一步提升了检测性能,尤其适用于超高纯电子化学品的检测。总结了ICP-QQQ在关键电子化学品检测痕量杂质元素方面的优势与挑战,详细论述其在酸性化学品、有机化学品中金属/非金属杂质检测的研究进展,特别针对高纯有机化学品及实验室本底控制等方法条件进行了深入探讨。最后,对ICP-QQQ技术的发展趋势进行了展望,并提出了未来研究方向,以期为相关领域研究提供参考。
The rapid advancement of semiconductor processes and technologies has led to the continuous miniaturization of integrated circuit(IC)devices and increasingly stringent requirements for environmental and raw material pollution control.As semiconductor manufacturing technology progresses to the nanoscale,the purity requirements for electronic chemicals have increased,with the detection of impurity levels decreasing from micrograms per liter(μg/L)to picograms per liter(pg/L).In semiconductor device manufacturing,controlling trace impurity elements and contamination is crucial.These impurities,which may originate from the wafer substrates or electronic chemical reagents,particularly metal ions and nanoparticles,can negatively impact device performance and yield.Therefore,semiconductor manufacturing plants must use high-purity chemical reagents and rigorously control impurity contamination.Inductively coupled plasma mass spectrometry(ICP-MS)has become one of the preferred techniques for detecting impurities in high-purity electronic chemicals due to its high sensitivity,capability for simultaneous multi-element detection,and strong tolerance for complex matrices.In recent years,ICP-MS technology has been continuously innovated,especially with the advent of triple quadrupole ICP-MS(ICP-QQQ),which has further enhanced detection performance and is particularly suitable for the detection of ultra-high-purity electronic chemicals.This article reviewed the advantages and challenges of ICP-QQQ in detecting trace impurity elements in key electronic chemicals and provided a detailed discussion on the research progress of metal/non-metal impurity detection in acidic and organic chemicals.Special attention was given to the methodological conditions for high-purity organic chemicals and laboratory background control.Finally,the future trends of ICP-QQQ technology are discussed,and potential research directions are proposed to serve as a reference for related studies in the field.
作者
曾远
贺兆波
杨磊
雷雯
吴昊
池汝安
李少平
ZENG Yuan;HE Zhao-bo;YANG Lei;LEI Wen;WU Hao;CHI Ru-an;LI Shao-ping(Hubei Three Gorges Laboratory,Yichang 443007,China;Hubei Sinophorus Electronic Materials Co.,Ltd.,Yichang 443007,China;Hubei University of Technology,Wuhan 430068,China)
出处
《化学试剂》
2025年第9期50-56,共7页
Chemical Reagents
基金
湖北省自然科学基金项目(2024AFD147,2024AFD140,2025AFD259)
宜昌市自然科学研究项目(A23-2-055)。
