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Defect control during CVD-growth for high performance MoS_(2)-based self-powered photodetector

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摘要 Two-dimensional(2D)transition-metal dichalcogenides(TMDs)materials have unique band structure as well as excellent electrical and optical properties,which exhibit great advantages in optoelectronic devices.Chemical vapor deposition(CVD),a method to realize the synthesis of large-scale 2D TMDs materials,will inevitably introduce defects in the growth process,thus decreasing the performance of 2D TMDs-based optoelectronic devices.In order to fundamentally address this issue,we proposed a method to gradually regulate the reaction concentration of precursor during growth.As a result,the suitable concentration of precursor can effectively enhance the probability of covalent binding of X-M(X:S,Se,etc.;M:Mo,W,etc.),thus suppressing the generation of vacancy defects.Furthermore,we explored sulfur vacancy(V_(S))on the performance of 2D molybdenum disulfide-based(MoS_(2)-based)self-powered devices through constructing p-type silicon/MoS_(2)(p-Si/MoS_(2))based p-n heterojunction.The photodetector composed of optimized MoS_(2) nanosheets exhibited high responsivity(330.14 A·W^(-1)),fast response speed(40μs/133μs),and excellent photovoltage stability.This method of regulating the low temperature region during CVD growth can realize the preparation of high-quality TMDs films and be applied in high-performance optoelectronic devices.
作者 Xinyue Pan Zhe Xu Jinhua Li Kaixi Shi Mingze Xu Xuan Fang Guannan Qu 潘新月;许喆;李金华;石凯熙;徐铭泽;方铉;曲冠男
出处 《Frontiers of physics》 2025年第2期33-43,共11页 物理学前沿(英文版)
基金 the National Natural Science Foundation of China(No.62174015) Department of Science and Technology of Jilin Province(No.YDZJ202402081CXJD).
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