摘要
将硅酸盐物料溶解于硫酸溶液中,并且基于单、二、三硅酸与钼酸反应速率的不同,确定了不同硅酸盐物料在硫酸溶液中形成的硅酸与钼酸的反应速率常数。硅酸钠、异极矿、硅锌矿溶解在硫酸溶液中所产生的单、二、三硅酸与钼酸的反应速率常数分别为K_(M1)=1.54×10^(-2) s^(-1),K_(D1)=2.89×10^(-3) s^(-1),K_(T1)=3.67×10^(-4) s^(-1);K_(M2)=2.30×10^(-2) s^(-1),K_(D2)=3.21×10^(-3) s^(-1),K_(T2)=3.10×10^(-4) s^(-1);K_(M3)=8.76×10^(-2) s^(-1),K_(D3)=1.13×10^(-3) s^(-1),K_(T3)=2.59×10^(-4) s^(-1)。方法重复性的RSD和精密度均小于4.84%,单硅酸的加标回收率为95%~105%。此方法应用于上述硅酸盐物料硫酸浸出液中低聚态硅酸的测定,结果满意。
Silicate materials were dissolved in sulfuric acid solution,and the reaction rate constants of molybdic acid and silicic acid formed by different silicate materials in sulfuric acid solution were determined based on the different reaction rate of monosilicic acid,disilicic acid,trisilicic acid and molybdic acid.The reaction rate constants of molybdic acid and monosilicic acid,disilicic acid,trisilicic acid produced by the reaction of sodium metasilicate,hemimorphite and willemite with sulfuric acid solution were:K_(M1)=1.54×10^(-1) s^(-1),K_(D1)=2.89×10^(-3) s^(-1),K_(T1)=3.67×10^(-4) s^(-1);K_(M2)=2.30×10^(-2) s^(-1),K_(D2)=3.21×10^(-3) s^(-1),K_(T2)=3.10×10^(-4) s^(-1);K_(M3)=8.76×10^(-2) s^(-1),K_(D3)=1.13×10^(-3) s^(-1),K_(T3)=2.59×10^(-4) s^(-1).The RSD of reproducibility and precision were both less than 4.84%,and standard recovery rate of mono-silicic acid were 95%~105%.The method has been applied to the determination of oligomeric silicic acid in the sulfuric acid leaching solution of silicate materials with satisfactory results.
作者
钱亚楠
徐红胜
刘夏
郭珈
张敏
王季睿
郑嘉豪
QIAN Yanan;XU Hongsheng;LIU Xia;GUO Jia;ZHANG Min;WANG Jirui;ZHENG Jiahao(School of Resources and Environmental Engineering,Jiangsu University of Technology,Changzhou 213001,China;Jiangsu Key Laboratory of Electronic Waste Resources Recycling,Changzhou 213001,China)
出处
《应用化工》
CSCD
北大核心
2024年第12期2897-2901,共5页
Applied Chemical Industry
基金
江苏省自然科学基金资助项目(BK20181041)
江苏理工学院研究生实践创新计划项目(XSJCX22_79)
江苏省高等学校大学生创新创业训练计划资助项目(202311463066Y)。
关键词
速差动力学光度法
硅酸盐物料
酸浸液
硅酸形态
differential kinetic spectrophotometry
silicate materials
acid leaching solution
silicic acid form
