摘要
TiN coatings were prepared by the novel dual-stage high power impulse magnetron sputtering(HIPIMS)technique under different deposition time conditions,and the effects of microstructure and stress state at different coating growth stages on the mechanical,tribological,and corrosion resistance performance of the coatings were analyzed.Results show that with the prolongation of deposition time from 30 min to 120 min,the surface structure of TiN coating exhibits a round cell structure with tightly doped small and large particles,maintaining the atomic stacking thickening mechanism of deposition-crystallization-growth.When the deposition time increases from 90 min to 120 min,the coating thickness increases from 3884 nm to 4456 nm,and the stress state of coating undergoes the compression-tension transition.When the deposition time is 90 min,TiN coating structure is dense and suffers relatively small compressive stress of−0.54 GPa.The coating has high hardness and elastic modulus,which are 27.5 and 340.2 GPa,respectively.Meanwhile,good tribological properties(average friction coefficient of 0.52,minimum wear rate of 1.68×10^(−4)g/s)and fine corrosion resistance properties(minimum corrosion current density of 1.0632×10^(−8)A·cm^(−2),minimum corrosion rate of 5.5226×10^(−5)mm·A^(−1))can also be obtained for the coatings.
利用新型双级高功率脉冲磁控溅射(HIPIMS)技术在不同沉积时间条件下制备TiN镀层,分析不同镀层生长阶段其微观结构与应力状态对镀层力学、摩擦、耐腐蚀等服役性能的影响。结果表明,随着沉积时间由30 min增加至120 min,TiN镀层表面结构均呈大小颗粒紧密掺杂的圆胞状结构,始终保持沉积-结晶-生长的原子堆积增厚机制;当沉积时间由90 min(镀层厚度3884 nm)增加至120 min(镀层厚度4456 nm)时,镀层应力状态出现压-拉转变。当沉积时间为90 min时,TiN镀层结构致密且受到较小的压应力(-0.54 GPa),镀层具有较高的硬度与弹性模量(27.5、340.2 GPa)、较好的摩擦学性能(平均摩擦系数0.52,最小磨损率1.68×10^(-4)g/s)及较好的耐腐蚀性能(最小腐蚀电流密度1.0632×10^(-8)A·cm^(-2)、最小腐蚀速率5.5226×10^(-5)mm·A-1)。
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2024年第12期3299-3305,共7页
Rare Metal Materials and Engineering
基金
Xi'an Science and Technology Plan Project(23GXFW0055)
Shaanxi Provincial Natural Science Basic Research Program Project(2024JC-YBQN-0525)
National Natural Science Foundation of China(52001251)。
