摘要
DNA合成技术是人类探索生命奥秘过程中的必要工具。当前广泛应用的DNA亚磷酰胺化学合成技术需要强酸脱保护步骤,可能造成脱嘌呤从而产生碱基缺失或者突变。该文设计合成了一种光敏型亚磷酰胺单体用于DNA非酸脱保护化学合成,单体的5’OH位点用光可裂解的邻硝基苄基化学基团保护,其在365 nm紫外光的短时间照射下,可高效脱去保护基,避免了强酸试剂的使用,并可以成功用于DNA合成的化学偶联,为实现高效低错误率的DNA合成技术提供了新思路。
DNA synthesis technology is a necessary tool in the process of human exploration of the mystery of life.However,the widely used DNA phosphoramidite chemical synthesis technology currently requires a strong acid deprotection step,leading to depurination and thus causing base loss or mutations.In this paper,a photosensitive phosphoramidite was synthesized for the chemical synthesis of DNA.The 5'OH position of the monomer was protected by a light-cleavable nitrobenzyl group,which could be efficiently removed from the protective group under the short-time irradiation of 365 nm UV light,avoiding the use of strong acid reagents.This monomer can be successfully used for DNA synthesis chemical coupling,providing a research foundation for achieving high-efficiency,low-error-rate DNA synthesis technology.
作者
何文寒
吴振坤
楚霞
He Wen-han;Wu Zhen-kun;Chu Xia(School of Hunan University Chemistry and Chemical Engineering,Changsha 410012,China)
出处
《化学传感器》
CAS
2024年第2期55-61,共7页
Chemical Sensors
基金
科技部重点研发计划项目(2018YFA0902301)。
关键词
DNA合成
光敏型保护基
亚磷酰胺单体
DNA synthesis
photosensitive protecting group
deoxynucleoside phosphoramidites
