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超薄铋系光催化剂的研究进展 被引量:3

The progress of ultrathin bismuth photocatalyst
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摘要 综述了近些年来超薄铋系材料在光催化领域的最新研究进展,包括有机污染物的光降解、光解水制氢、二氧化碳还原等方面。铋系材料是一类禁带宽度适中、成本低廉、无毒无害的光催化剂,其带隙可调性与形貌可调性为实现超薄结构下良好的光催化性能提供了基础条件,开发具有二维层状结构的可见光响应型光催化剂引起了国内外学者的极大关注。简要介绍了近几年被广泛研究探讨的多种铋系光催化材料,总结了超薄铋系光催化剂的合成改性方法,如超声辅助液相剥离、插层辅助液相剥离、水热/溶剂热、原子层沉积等,并对当前制备超薄铋系光催化剂存在的问题以及未来的潜在应用价值与发展趋势进行了展望。 The latest research progress of ultrathin bismuth-based materials in the field of photocatalysis in recent years is reviewed,including pollutant degradation,photocatalytic hydrogen evolution,and reduction of carbon dioxide.As an innovative kind of semiconductor photocatalytic material,bismuth-based material is a kind of photocatalyst with moderate band gap,low cost,non-toxic and harmless.Its band gap adjustability and morphology adjustability provide the basic conditions for achieving good photocatalytic performance under ultrathin structure.The development of visible-light-responsive photocatalysts with two-dimensional layered structures has attracted extensive interest from scholars.Then,various bismuth-based photocatalytic materials that have been extensively studied are briefly introduced.The synthesis and modification methods of ultrathin bismuth-based photocatalysts are summarized,including sonication-assisted liquid exfoliation,ion intercalation-assisted liquid exfoliation,hydro/solvothermal synthesis,atomic layer deposition,etc.The problems existing in the preparation of ultrathin bismuth-based photocatalysts and the potential application value and development trend in the future are prospected.
作者 胡帅奇 黄金田 HU Shuai-qi;HUANG Jin-tian(College of Materials Science and Art Design,Inner Mongolia Agricultural University,Hohhot 010018,China)
出处 《应用化工》 CAS CSCD 北大核心 2024年第1期206-211,217,共7页 Applied Chemical Industry
基金 内蒙古自治区科技计划项目(2021GG0074)。
关键词 超薄 铋系 光催化剂 合成 应用 ultrathin bismuth-based photocatalysts fabrication application
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