摘要
介绍了纳米结构制作的一种新方法———纳米印刷光刻的基本原理、总体方案。该技术与其它微刻印技术相比,具有成本低、生产效率高、可批量生产、工艺过程简单等优点。介绍了SiC模板的制作方法、用纳米印刷光刻技术制作纳米结构的加工步骤及刻印结果。结果表明该技术可制作特征尺寸小于100nm的图形。本文还展望了其应用于微电子学等领域的前景。
A new method of fabricating nanostructures---nanoimprint lithography is introduced.The basic principle and the overall schemes are described.Compared with other micro-lithographic techniques,this technique has many advantages such as low cost,high throughput ,mass produc-tion,simple process etc.The method of fabricating SiC mold,processing steps using nanoimprint lithography technology and the acquired results are described.Results show that this technique can be used to fabricate nanostructures with feature size smaller than100nm,and the applica-tion potential in microelectronics and other fields has been discussed.
出处
《微纳电子技术》
CAS
2002年第12期36-39,共4页
Micronanoelectronic Technology
基金
中国科学院知识创新工程项目(A2K0009)
微细加工光学技术国家重点实验室开放基金课题(KFS4)资助
