摘要
为获得理想的GH4169抛光表面粗糙度和表面残余应力,提出了面向多目标的抛光工艺参数优选区间划分方法,设计了五因素三水平抛光正交试验;根据试验结果标准差计算了工艺参数对各优化目标影响的权重系数,并将多优化目标变换为综合优化目标;通过趋势图分析了各个优化目标随工艺参数增大的变化机理及趋势;按照所提方法确定了工艺参数优选区间,并通过实验进一步验证了优选区间的可靠性。
In order to obtain the ideal polishing surface roughness and polishing surface residual stress of GH4169,a double objective optimal interval division method for polishing process parameters was proposed,and five-factor three-level polishing orthogonal test was designed;According to the standard deviation of the test results,the influence weight coefficients of the process parameters on the optimization objectives were calculated,and multiple optimization objectives were transformed into a comprehensive optimization objective.The change mechanisms and trends of the optimization objectives with the increasing of process parameters were analyzed via tendency chart.The optimal process parameters were determined with the proposed method,and its reliability was further verified via an experiment.
作者
淮文博
史耀耀
杜羽寅
贾楠
HUAI Wenbo;SHI Yaoyao;DU Yuyin;JIA Nan(National Experimental Demonstration Teaching Center for Engineering Training,Xi′an University of Technology,Xi′an 710054,China;School of Mechatronics,Northwestern Polytechnical University,Xi′an 710072,China)
出处
《机械科学与技术》
CSCD
北大核心
2021年第5期721-726,共6页
Mechanical Science and Technology for Aerospace Engineering
基金
国家自然科学基金项目(51675439)。
关键词
砂布轮
抛光
GH4169
双优化目标
工艺参数
优化
abrasive cloth wheel
polishing
GH4169
double optimization objectives
process parameters
optimization
