摘要
用磁控溅射法在Ti基底上沉积了FeCoNiMoCr高熵合金薄膜并制成电极,用SEM和EDS观察和分析了电极表面和横截面的形貌和元素分布,用表面轮廓测量仪测量了电极的表面粗糙度,用XRD分析了电极的物相和结构,使用电化学工作站表征了电极的电化学性能。结果表明,电极的表面粗糙、元素分布均匀,电极上的膜厚约为2.40μm,薄膜呈非晶态。电极在碱性溶液中表现出良好的析氧性能和稳定性。在电流密度为10.0 mA/cm2条件下,过电位为360 m V、Tafel斜率为73.45 m V/dec。在过电位为360 mV的条件下连续使用24 h,电流密度没有明显的衰减。循环伏安实验和电化学阻抗分析的结果表明,FeCoNiMoCr高熵合金薄膜本征催化活性的提高使电极的电催化析氧性能优于贵金属RuO2(过电位为409 mV,Tafel斜率为94.18 mV/dec)。
Thin film of high entropy FeCoNiMoCr alloy was deposited on Ti substrate by magnetron sputtering method to obtain high entropy film electrode.The surface morphology,composition,phase constituent,structure and performance of the electrode were characterized by means of surface profilometer,SEM-EDS,XRD and electrochemical workstation.The results show that the electrode surface is rough,the constituent elements are evenly distributed,the film thickness is about 2.40μm,and the film is amorphous.The electrode showed good oxygen evolution performance and good stability in the alkaline solution.Under the condition of current density of 10.0 mA/cm2,the overpotential was 360 mV,the Tafel slope was 73.45 mV/dec.Under the condition of overpotential of 360 mV,the current density was not significantly attenuated after continuous use for 24 hours.The results of cyclic voltammetry and electrochemical impedance analysis show that due to the improved intrinsic catalytic activity,the film electrode have electrocatalytic oxygen evolution performance better than that of the noble metal oxide RuO2(over potential 409 mV,Tafel slope 94.18 mV/dec).
作者
张泽灵
王世琦
徐邦利
赵昱皓
张旭海
方峰
ZHANG Zeling;WANG Shiqi;XU Bangli;ZHAO Yuhao;ZHANG Xuhai;FANG Feng(School of Materials Science and Engineering,Southeast University,Nanjing 211189,China;Jiangsu Key Laboratory of Advanced Metallic Materials,Southeast University,Nanjing 211189,China)
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
2021年第3期193-200,共8页
Chinese Journal of Materials Research
基金
江苏省333工程资助项目(BRA2018045)
江苏省自然科学基金(BK20180264)。
关键词
金属材料
高熵薄膜电极
析氧性能
磁控溅射
非晶
metallic materials
high-entropy thin film electrode
oxygen evolution performance
magnetron sputtering
amorphous microcrystalline