摘要
报道一种制备高性能氧化钒热敏薄膜的方法和其应用。采用反应磁控溅射薄膜沉积技术,通过改变氧化钒热敏薄膜沉积时溅射功率,从而调整钒原子在溅射出来之后接触到基片表面时的沉积速率,同时通过对设备进行改造升级,即在钒溅射腔腔外增加一个控制电源来精确控制溅射电压及氧气分压等参数来精确控制反应过程中电流密度,优化了氧化钒薄膜的制备工艺,制备出方块电阻为500 kΩ/,电阻温度系数(TCR)为-2.7%K^(-1)的氧化钒薄膜。实验测试结果表明,利用高性能氧化钒热敏薄膜制作的非制冷红外焦平面探测器,其噪声等效温差(NETD)降低30%,噪声降低28%,显著提升了非制冷焦平面探测器的综合性能。
A method for preparing high performance vanadium oxide thermosensitive thin films and its application were reported.Using reactive magnetron sputtering film deposition technology,the preparation process of vanadium oxide thin films was optimized by changing the sputtering power during the deposition of vanadium oxide thermosensitive thin films,the deposition rate of vanadium atoms was adjusted when they touched the surface of the substrate after being sputtered.At the same time,the equipment was modified and upgraded,that is,a control power supply outside the vanadium sputtering chamber was added to accurately control the sputtering voltage and oxygen partial pressure and other parameters to accurately control the current density in the reaction process.A vanadium oxide film with a sheet resistance of 500 kΩ/□and a temperature coefficient of resistance(TCR)of-2.7%K^(-1)was prepared.The experimental results show that the noise equivalent temperature difference(NETD)performance of uncooled infrared focal plane detector made of highperformance vanadium oxide thermal sensitive film is reduced by 30%and the noise is reduced by 28%.The overall performance of the uncooled focal plane detector has been improved significantly.
作者
马占锋
王颖
汪超
叶帆
高健飞
黄立
Ma Zhanfeng;Wang Ying;Wang Chao;Ye Fan;Gao Jianfei;Huang Li(Wuhan Guide Infrared Co.,Ltd.,Wuhan 430205,China)
出处
《红外与激光工程》
EI
CSCD
北大核心
2021年第2期62-67,共6页
Infrared and Laser Engineering
关键词
氧化钒薄膜
反应磁控溅射
TCR
非制冷红外焦平面探测器
vanadium oxide film
reactive magnetron sputtering
TCR
uncooled infrared focal plane detector
