期刊文献+

镍钝化多孔硅表面形貌的控制和光致发光性能的改善

Morphology Control and Photoluminescence Improvement of Nickelpassivated Porous Silicon
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摘要 利用水热技术制备了系列镍钝化多孔硅样品,并对其表面形貌和光致发光谱进行了研究。实验表明,样品的表面形貌与其光致发光特性之间存在强烈的关联:采用具有较低Ni^(2+)浓度的腐蚀液所制备的样品表面形貌更为均匀,并具有相对较强的发光和较窄的发光峰。初步探索了通过对样品表面形貌的控制来改善样品发光性能的有效途径。 Series of nickel-passivated porous silicon were fabricated by hydrothermally etching single crystal silicon wafers under different etching conditions. Morphology and photoluminescence (PL) investigation are disclosed that there exist strong correlation between the characteristics of the surface morphology and PL, i.e., the samples prepared with lower Ni^(2+) concentration are exhibited more regular surface morphology, stronger PL, as well as narrower PL band. The possibility of the realization of the PL improvement through controlling the surface morphology of porous silicon is also explored.
出处 《科学技术与工程》 2002年第5期6-9,共4页 Science Technology and Engineering
基金 国家自然科学基金(19904011)资助 河南省杰出青年科学基金(0014)资助
关键词 光致发光性能 镍印化多孔硅 表面形貌 光致发光谱 发光强度 半导体材料 多孔硅材料 nickel-passivated porous silicon morphology photoluminescence
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参考文献10

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