摘要
以新一代同步辐射光源和全相干X射线自由电子激光为代表的先进光源已成为众多学科领域中一种不可或缺的研究工具。先进光源技术不断进步,驱动超精密光学制造快速发展,先进光源中关键聚焦光学元件K-B镜的面形精度是影响光源性能的重要指标,要求其在几十纳弧度以下。然而,高精度K-B镜面形检测技术依然存在较大技术挑战,一直是国内外研究热点。本文介绍了反射式轮廓测量技术即长程轮廓仪(LTP)、纳米测量仪(NOM)以及拼接干涉检测技术等典型K-B镜面形检测技术的基本原理,对比分析了其技术特点,综述了国内外K-B镜面形检测技术的研究现状和最新进展,对发展趋势进行了展望。
The advanced light source represented by the new generation of the diffraction limit synchrotron radiation source and the full-coherent X-ray free-electron laser has become an indispensable research tool in many fields.The continuous development of advanced light sources drives the rapid progress of ultra-precision optical manufacturing.The surface precision of a K-B mirror,a key focusing optical element in advanced light sources,is an important factor,which should be less than tens of nano radians.However,high precision K-B mirror surface metrology still has great technical challenges and is now a research hotspot in the scientific community.This paper introduces typical K-B mirror surface metrology,including reflection profile measuring technology such as the Long Trace Profiler(LTP),the Nanometer Optical component Measuring(NOM),and stitching interference metrology.Current K-B mirror surface shape technologies are summarized and the upcoming research progress is prospected.
作者
张帅
侯溪
ZHANG Shuai;HOU Xi(Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China;University of Chinese Academy of Sciences,Beijing 100049,China)
出处
《中国光学》
EI
CAS
CSCD
北大核心
2020年第4期660-675,共16页
Chinese Optics
基金
国家自然科学基金面上资助项目(No.61675209)。
关键词
X射线光学
K-B镜
光学测量
面形检测
拼接干涉
X-ray optics
K-B mirror
optical measurement
surface metrology
stitching interferometer
