摘要
采用直流反应磁控溅射法在氧化铟锡(ITO)玻璃上溅射一层掺氧含量为30%的氧化钨薄膜(WOx),并在此基础上溅射了掺氧含量不同的氧化钽薄膜(TaOx).利用X射线衍射仪以及能谱仪对氧化钽薄膜的物相结构以及元素的相对变化量进行了分析,使用扫描电子显微分析了薄膜的表面形貌,采用紫外分光光度计与电化学工作站配合测量薄膜的透射率,对薄膜的电致变色性能进行了研究.结果表明:所溅射的氧化钽薄膜均为非晶态结构,随着掺氧含量的增加,薄膜氧含量越接近71.4%,薄膜对氧化钨的保护性能呈现下降趋势,并在氧含量为70.08%时得到对氧化钨的最优保护性能,此时电致变色薄膜着色响应时间为21 s.添加氧化钽薄膜减少了电致变色薄膜的开关峰值电流与泄漏电流,使得器件的充电容量保持稳定,循环稳定性能得到提升.
A tungsten oxide thin film(WOx)with 30%oxygen content was sputtered on indium tin oxide(ITO)glass by DC reactive magnetron sputtering.On this basis,tantalum oxide thin films(TaOx)with different oxygen content were sputtered.The phase structure and the relative change of elements of tantalum oxide film were analyzed by X-ray diffraction and energy dispersive spectrometer.The surface morphology of tantalum oxide film was analyzed by scanning electron microscopy.The transmission of tantalum oxide film was measured by ultraviolet spectrophotometer and electrochemical workstation.The electrochromic property of tantalum oxide film was studied.The results show that the sputtering tantalum oxide films are all amorphous structure.With the increase of the oxygen content,the oxygen content of the films is close to 71.4%,and the protection performance of the films to tungsten oxide shows a downward trend.When the oxygen content is 70.08%,the optimal protection performance to tungsten oxide is obtained.At this time,the coloring response time of the electrochromic films is 21 s.The addition of tantalum oxide film reduces the switching peak current and leakage current of the electrochromic film,and keeps the charge capacity stable and improves the cycle stability of the device.
作者
杨恢东
夏锦辉
彭斯冉
张婧妍
鲍飞雄
刘雅晴
YANG Hui-dong;XIA Jin-hui;PENG Si-ran;ZHANG Jing-yan;BAO Fei-xiong;LIU Ya-qing(School of Information Science and Technology,Jinan University,Guangzhou 510632,China;Jinan University Shaoguan Research Institute,Shaoguan,Guangdong 512027,China)
出处
《光子学报》
EI
CAS
CSCD
北大核心
2019年第12期258-266,共9页
Acta Photonica Sinica
基金
广东省大学生科技创新培育专项基金(No.pdjh2017b0056)
广东省省级科技计划项目(No.2014A010106014)
暨南大学韶关研究院新型研发机构初创期建设补助项目(No.2016B090919014)~~
关键词
磁控溅射
透射率
电致变色
响应时间
泄漏电流
Magnetron sputtering
Transmittance
Electrochromic
Response time
Leakage currents
