摘要
介绍了等离子体化学气相沉积(PCVD)氮化钛工艺的特点,通过对氮化钛涂层的性能分析及在涂层刃具上的应用实例,说明了该工艺与同类气相沉积工艺相比具有的先进性、实用性。
This paper introduces the characteristics of PCVD process and also discusses the advantage and practicability of the process comparing with the same kind of vapor deposition process through the analysis on the performance of TiN coatings and the application to the coated cutters.
出处
《表面技术》
EI
CAS
CSCD
1992年第5期235-238,共4页
Surface Technology
关键词
气相沉积
氮化钛
刀具
plasma
chemical vapor deposition
TiN
coated cutter
