摘要
The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature was investigated. Helium ions with energies of 40keV and 60keV were implanted within the fluence range (1.0～4.0)×1018ions/cm2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different fluences, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, secondgeneration blistering and porous structure. The dependdence of surface damage modesand the critical fluence for the onset of blistering and flaking on the sort of materials and ion energy was discussed.
The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature was investigated. Helium ions with energies of 40keV and 60keV were implanted within the fluence range (1.0~4.0)×1018 ions/cm2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different fluences, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, secondgeneration blistering and porous structure. The dependence of surface damage modes and the critical fluence for the onset of blistering and flaking on the sort of materials and ion energy was discussed.
基金
the National Natural Science Foundation (19775058 and 10075064), Natural ScienceFoundation of Gansu Province (ZR96-025) and th
关键词
非晶体合金
结泡
表面剥落
氦离子轰击
Blistering, Flaking, Exfoliation, Helium ion implantation, Amorphous alloy
