摘要
利用介质阻挡放电,在常压下进行非平衡等离子体渗氮通过正交试验研究渗氮工艺参数的作用,分析渗氮膜层的相结构及其显微组织,确定常压下较为理想的渗氮工艺参数.试验结果表明,新工艺能在较短时间内获得较高的表面硬度与理想的扩散层;整个工艺过程操作简便,省去了真空放电下必需的真空设备,是一种极具发展前景的新型渗氮工艺.
Using dielectric barrier discharge (DBD), atmospheric pressure non-equilibrium plasma nitriding technology is under development. The effects of nitriding parameters on the properties of the nitriding layer are studied by the means of orthogonal experiment. The microstructure and phases of nitriding layer are analyzed. The results of this new technology show that thicker white-layer and diffusion layer on the treated surface can be acquired in a shorter time compared with the vacuum plasma nitriding. In the same time, the nitriding process can be done without expensive vacuum equipment as well. The whole process is convenient. The new technology will be promising in the field of mechanical industry in the future.
出处
《大连海事大学学报》
CAS
CSCD
北大核心
2002年第3期97-100,共4页
Journal of Dalian Maritime University
关键词
电介质阻挡放电
正交试验
非平衡等离子体
渗氮
表面改性
热处理
dielectric barrier discharge
orthogonal experiment
non-equilibrium plasma
nitriding
surface modification
heat treatment
