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电化学法制备HAP-TC4涂层的工艺性能研究

Study on Electrochemical Process Performance of HAP-TC4 Coating
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摘要 本文对共沉淀法制备HAP粉体及电化学法制备HAP涂层进行了工艺性能探究。HAP粉体制备中,按Ca/P比为1.67配置Ca(NO_3)_2·4H_2O和(NH_4)_2HPO_4溶液,控制反应溶液pH值及烧结温度等因素,通过SEM电镜观察组织形貌,分析pH值对致密度、孔隙度等的影响,结果表明pH=9时效果较佳;烧结温度在700℃时形貌较为理想。在电化学法制备HAP涂层实验中,通过改变沉积电压,得出在-3V沉积时涂层与基体结合较为理想。同时研究了沉积涂层质量、电流与时间之间的关系,这将为控制沉积时间控制涂层厚度提供理论依据。 In this paper, both coprecipitation preparation of HAP powder and the electrochemical preparation of HAP coating process performance are done. HAP powder preparation, which is Ca/P ratio 1.67 configuration Ca (NO3 )2 · 4H2O and (NH4 )2 HPO4 solu- tion, is done when PH and sintering temperature on the reaction solution are considered. Tissue morphology is observed by SEM. Influ- ence of pH value on the density and porosity are analyzed. Results show that the effect is better when pH is 9. Sintering temperature at 700℃ is good.. In the electrochemical preparation of HAP coating experiments, by changing the deposition voltage, when the voltage is - 3 V, deposition coating and matrix combined are better. The deposition coating quality were studied, the relationship between the current and time is done, which will provide theoretical basis for control of deposition time control coating thickness.
出处 《洛阳理工学院学报(自然科学版)》 2017年第4期10-13,96,共5页 Journal of Luoyang Institute of Science and Technology:Natural Science Edition
关键词 钛合金 羟基磷灰石 共沉淀法 电化学法 titanium alloy hydroxyapatite coprecipitation electrochemical process
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