摘要
本实验采用直流磁控溅射法制备了一种非晶的富TiNiTi薄膜 ,其成分为Ni46.3 4% (原子分数 ) ,Ti 5 3 .66% (原子分数 )。采用变温方法研究了这种非晶薄膜的晶化动力学。测得非晶薄膜晶化的激活能为 2 71kJ/mol ,平均Avrami指数为 1.17。采用以上获得的动力学参数计算了薄膜在 773K的等温晶化动力学曲线。计算结果与实验结果吻合较好。在薄膜的晶化过程中伴随着Ti2
Amorphous Ti rich NiTi film(with Ni46.36at%,Ti53.64at%) was prepared by DC magnetron sputtering. The crystallization kinetics of this film was determined by using non isothermal technique. The mean activation energy of crystallization was 271kJ/mol.The mean value of Avrami parameter was 1.17. The isothermal kinetics curve was calculated with above parameters. It was coincide with the result of XRD measurement.The crystallization of amorphous film was accompanied with the precipitation of Ti 2Ni.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2002年第4期389-390,共2页
Journal of Functional Materials
基金
国家自然科学基金资助项目 (698780 1 1 )
