摘要
利用直流非平衡磁控溅射技术,在100℃条件下,在单晶硅上制备了具有红外增透效果的类金刚石薄膜,研究了偏压对薄膜结构、机械性能和红外光学性能的影响,解释了薄膜结构与性能之间的关系。利用场发射扫描电镜(FESEM)、Dektak150型台阶仪、Raman光谱仪、纳米压痕仪、椭偏仪和傅里叶红外吸收光谱仪表征薄膜形貌、结构、硬度、折射率和红外光学性能。实验结果表明:在偏压为-100 V时,薄膜中sp3相含量最高,得到最大的纳米硬度14.8 GPa和最大折射率2.36,此时透光率为67.3%;在偏压为-200 V时,薄膜硬度为11.2 GPa,薄膜的折射率为2.06,最接近零反射膜所需折射率,此时透过率最大。
Based on the concept of the direct current unbalanced magnetron sputtering technology, a series of diamond-like carbon（DLC） films with antireflection effect was prepared on a silicon substrate by changing the negative bias voltage at a deposition temperature of 100℃. Field emission scanning electron microscopy （FESEM）, profilometry （Dektak150）, Raman spectroscopy, nano indentation, elliptic partial techniques, and Fourier infrared absorption spectroscopy were used to characterize the morphology, structure, hardness, refractive index, and IR optical performances of the films. The experimental results for different biases showed the highest sp^3 content, largest nanohardness of 14.8 GPa, maximum refractive index of 2.36, and transmission rate of 67.3% for a bias voltage of -100 V. The hardness of the film was 11.2 GPa and the refractive index was 2.06, which was the closest to the refractive index of zero reflection films, when the bias voltage was -200 V. For this value, the film also demonstrated the maximum transmittance.
出处
《红外技术》
CSCD
北大核心
2017年第8期677-681,687,共6页
Infrared Technology
基金
中央高校基本科研业务费科研专项理工类跨学科项目资助(CDJZR14135502)
重庆市基础与前沿研究计划项目(cstc2015jcyj A70005)
材料腐蚀与防护四川省重点实验室开放基金(2016CL13)
关键词
红外窗口
类金刚石薄膜
脉冲负偏压
力学性能
光学性能
infrared window, diamond like carbon films, pulsed negative bias, mechanical properties,optical properties
