摘要
The growth and structural properties of Ag films prepared by radio-frequency（2, 13.56 and27.12 MHz） and very-high-frequency（40.68 and 60 MHz） magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface.Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions＇ energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films.
The growth and structural properties of Ag films prepared by radio-frequency（2, 13.56 and27.12 MHz） and very-high-frequency（40.68 and 60 MHz） magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface.Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions＇ energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films.
基金
supported by National Natural Science Foundation of China(Nos.11675118 and 11275136)
