摘要
采用磁控溅射交替溅射WS2和石墨靶,在200℃的Si基体上制备了不同调制比的WS_x/a-C多层膜(调制周期约为20 nm).利用扫描电镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)、X射线光电子谱(XPS)等手段表征了多层膜的微观结构;采用纳米压痕仪、薄膜应力测试仪、涂层附着力划痕仪和球盘式摩擦磨损试验机测试多层膜的机械性能及大气中的的摩擦磨损性能.结果表明:WS_x/a-C多层膜表面平整、结构致密,S/W比在0.92~0.97范围内波动,WS_x子层以微晶的形式存在,WS_x/a-C相界面处形成了WC相.随着调制比的增加,多层膜的硬度由7.8 GPa升高至9.0GPa,膜内压应力先减小后增大,结合力单调减小,摩擦系数由0.18增至0.29,磨损率迅速升高.调制比为1∶39的多层膜的摩擦学性能最佳,其磨损率约为6.1×10^(–15) m^3/(N·m).
WSx/a-C multilayer films with different modulation ratios （modulation period-20 nm） were prepared on monocrystalline silicon substrate by magnetron sputtering at 200 ℃. The morphology, microstructure and composition of the films were characterized by using scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray diffractometer and X-ray photoelectron spectroscopy. The mechanical properties and tribological behavior in air of the films were investigated by using nano-indentation tester, residual stress tester, scratch tester and ball-on-disc tribotester. The results show that the WSx/a-C multilayer films were of smooth and compact structure and the S/W ratio fluctuated in the range of 0.92-0.97. The WSx sublayer was defined as crystallite and the WC phase was found at the interface between WSx sublayer and a-C sublayer. As increasing the modulation ratio, the hardness of the film increased from 7.8 GPa to 9.0 GPa, the compressive stress in the film decreased first and then increased. In addition, the adhesion strength of film to the substrate decreased monotonically, the friction coefficient increased from 0.18 to 0.29 and the wear rate presented a significant increase. The film with modulation ratio of 1 ： 39 was of the best tribological performance and its wear rate was about 6.1 ×10-15 m3/（N.m）.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
2017年第3期387-394,共8页
Tribology
