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高温下液硅的润湿性

Wettability Research of Liquid Silicon In High-temperature
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摘要 液硅在耐高温材料上的润湿性对于低成本太阳能电池生产过程中硅的精炼和铸造具有重要的研究意义。为了研究液硅的润湿性,采用座滴法分别研究真空和氩气气氛以及不同温度条件下液硅在高纯石墨以及刚玉基底材料上的接触角。实验结果表明,高纯石墨基底材料表面越粗糙,液硅所形成的接触角越小,从而润湿性越好;真空条件下液硅在刚玉上的接触角并没有随着加热温度的上升呈现下降的趋势,而是在88°~90°的范围内波动,分析图像的过程中可明显看到液硅在刚玉基底材料上左右来回蠕动的现象。 The wetting behavior of molten silicon as a refractory materials is important in the refining and casting of silicon for producing the low-cost solar cells.In order to investigate the wettability,the contact angles of molten silicon dropping on the high-purity graphite and corundum substrates are measured in vacuum and argon atmosphere,respectively,at different temperatures by the sessile drop method.Experimental results show that the rougher the surface of graphite substrate is,the smaller the contact angle is,and then the the wettability becomes better.Moreover,the contact angle of molten silicon on corundum substrate does not decrease but fluctuates within a small range of angle with the increase of time and temperature,because the molten silicon moves back and forth obviously during the process of image analysis.
作者 余心成 坎标 孙涛 丁建宁 袁宁一 YU Xincheng KAN Biao SUN Tao DING Jianning YUAN Ningyi(School of Materials Science and Engineering, Jiangsu Collaborative Innovation Center of Photovolatic Science and Engineering, Changzhou University, Changzhou 213164, China Jiangsu Province Cultivation base for State Key Laboratory of Photovoltaic Science and Technology, Changzhou 213164, China)
出处 《材料科学与工程学报》 CAS CSCD 北大核心 2017年第2期292-295,共4页 Journal of Materials Science and Engineering
基金 国家自然科学基金重点资助项目(51335002) 江苏省优势学科建设工程资助项目 江苏省高校青蓝工程资助项目
关键词 液硅 座滴法 高温润湿性 接触角 liquid silicon sessile drop method high temperature wettability contact angle
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  • 1汤伟,朱定一,陈丽娟,关翔锋.基于分子动力学结合神经网络的Au表面能计算方法[J].中国有色金属学报,2005,15(1):105-109. 被引量:2
  • 2朱定一,戴品强,罗晓斌,张远超.润湿性表征体系及液固界面张力计算的新方法(Ⅰ)[J].科学技术与工程,2007,7(13):3057-3062. 被引量:74
  • 3陈传煊.表面物理化学[M].北京:科学技术文献出版社,1995.12-83.
  • 4Garner WE.[J]. J ChemSoc, 1947, 1239-1244.
  • 5Stalder A F, Kulik G, Sage D, et al. A snake-based approach to accurate determination of both contact points and contact angles [J]. Colloids and Surfaces A: Physicochem Eng Aspects, 2006, 286(1-3):92-103.
  • 6Rhee S K.[J]. J Am Ceram Soc, 1972, 55(6) :300-303.
  • 7许并社.材料界面的物理化学[M].北京:化学工业出版社,2006,107-116.
  • 8Mcnally R N, Yeh H C, et al. [J]. Journal of Materials Science, 1968, 3(2) : 136-138.
  • 9Lee J, Nakamoto M, Tanaka T. Thermodynamic study on the melting of nanometer-sized goid particles on graphite substrate [J]. Journal of materials science, 2005, 40(9-10) : 2167-171.
  • 10Sang hoon Junga, Takashi Ishikawab, Hideo Nakaee. Critical eonditions for formation of spheroidal graphite[J]. Mater Sci Eng A (2007), doi: 10. 1016/j. msea. 2007.07. 013.

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